Inventor

PUTNA ERNISSE

US3 patents

Patents

3 patents

US7507521B2Mar 24, 2009

Silicon based optically degraded arc for lithographic patterning

INTEL CORP2 citations57

US7391501B2Jun 24, 2008

Immersion liquids with siloxane polymer for immersion lithography

INTEL CORP2 citations57

US7687225B2Mar 30, 2010

Optical coatings

INTEL CORP1 citations47