Inventor · disambiguated record
Joo-On Park
Also filed as: PARK JOO-ON
8 granted patents·2 pending applications·47 citations·filing 1998–2015
81Inventor score
Files withSAMSUNG ELECTRONICS CO LTD4PARK CHANG-MIN2HEO JIN-SEOK1HYUNDAI ELECTRONICS IND1LEE JEONG HOON1
Top patents by PatentIndex Score
10 records- 0189US9632437B2Lithography apparatus, method for lithography and stage systemSAMSUNG ELECTRONICS CO LTD·Filed 2013·Granted Apr 25, 2017·6 cites·20 claims
- 0285US7604907B2Multi-exposure semiconductor fabrication mask sets and methods of fabricating such multi-exposure mask setsSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Oct 20, 2009·8 cites·21 claims
- 0373US6045967AMethod and device using ArF photoresistHYUNDAI ELECTRONICS IND·Filed 1998·Granted Apr 4, 2000·32 cites·20 claims
- 0458US8625110B2Methods of inspecting structuresWOO SEOUK-HOON·Filed 2010·Granted Jan 7, 2014·1 cites·13 claims
- 0548US8599360B2Reflective reticle chuck, reflective illumination system including the same, method of controlling flatness of reflective reticle using the chuck, and method of manufacturing semiconductor device using the chuckHEO JIN-SEOK·Filed 2010·Granted Dec 3, 2013·0 cites·11 claims
- 0643US9057954B2Apparatus for creating an extreme ultraviolet light, an exposing apparatus including the same, and electronic devices manufactured using the exposing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2013·Granted Jun 16, 2015·0 cites·22 claims
- 0742US9575421B2Apparatus for protecting extreme ultra violet mask and extreme ultra violet exposure apparatus including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Feb 21, 2017·0 cites·20 claims
- 0842US8287792B2Methods of forming fine patterns using a nanoimprint lithographyLEE JEONG-HOON·Filed 2010·Granted Oct 16, 2012·0 cites·11 claims
- 0934US2011183239A1Photolithography Mask, Blank Photomask, Reflective Photomask, and Methods of Manufacturing the SamePARK CHANG-MIN·Filed 2010·Application pending·0 cites
- 1033US2010230864A1Nanoimprint Lithography Template and Method of Fabricating Semiconductor Device Using the SamePARK CHANG-MIN·Filed 2010·Application pending·0 cites
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