Inventor
CHAO CHA-HSIN
TW33 patents
⚠️ This page may combine multiple inventors who share the name “CHAO CHA-HSIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
29 patentsUS10083863B1Sep 25, 2018
Contact structure for semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD77 citations97
US11088025B2Aug 10, 2021
Contact structure for semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD12 citations93
US9905456B1Feb 27, 2018
Semiconductor device and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US10679896B2Jun 9, 2020
Contact structure for semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations83
US10510598B2Dec 17, 2019
Self-aligned spacers and method forming same
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations83
US9837539B1Dec 5, 2017
FinFET device and method of forming
TAIWAN SEMICONDUCTOR MFG CO LTD6 citations83
US10629480B2Apr 21, 2020
Method for forming semiconductor device structure
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US11776847B2Oct 3, 2023
Contact structure for semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US10515817B2Dec 24, 2019
Method for forming features of semiconductor structure having reduced end-to-end spacing
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US10153373B2Dec 11, 2018
FinFET device and method of forming
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US12354913B2Jul 8, 2025
Contact structure for semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11532515B2Dec 20, 2022
Self-aligned spacers and method forming same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11424364B2Aug 23, 2022
FinFET device and method of forming
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11232978B2Jan 25, 2022
Semiconductor device and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11211496B2Dec 28, 2021
FinFET device and method of forming
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11139174B2Oct 5, 2021
Method for forming features of semiconductor structure having reduced end-to-end spacing
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11022878B2Jun 1, 2021
Critical dimension uniformity
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10495970B2Dec 3, 2019
Critical dimension uniformity
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US10157782B2Dec 18, 2018
Semiconductor device and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US12444580B2Oct 14, 2025
Plasma processing apparatus and method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations59
US10985053B2Apr 20, 2021
Contact plugs and methods of forming same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations59
US12074074B2Aug 27, 2024
Method and system for processing wafer
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations57
US12531217B2Jan 20, 2026
Laser array system for improved local CD uniformity
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10879109B2Dec 29, 2020
Method for forming semiconductor device structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10651079B2May 12, 2020
Semiconductor device and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10049983B2Aug 14, 2018
Semiconductor device and method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10804149B2Oct 13, 2020
Self-aligned spacers and method forming same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10727346B2Jul 28, 2020
FinFET device and method of forming
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10269624B2Apr 23, 2019
Contact plugs and methods of forming same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations48
UNIV NAT TAIWAN
3 patentsUS6940174B2Sep 6, 2005
Metallic photonic box and its fabrication techniques
UNIV NAT TAIWAN6 citations62
US7863608B2Jan 4, 2011
High efficiency lighting device and method for fabricating the same
UNIV NAT TAIWAN0 citations52
US8030189B2Oct 4, 2011
Method for maintaining a smooth surface of crystallizable material
UNIV NAT TAIWAN1 citations49