Inventor
UNO TOSHIYUKI
JP26 patents
⚠️ This page may combine multiple inventors who share the name “UNO TOSHIYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
AGC INC
11 patentsUS12216397B2Feb 4, 2025
Reflective mask blank for EUV lithography, mask blank for EUV lithography, and manufacturing methods thereof
AGC INC2 citations73
US11822229B2Nov 21, 2023
Reflective mask blank for EUV lithography, mask blank for EUV lithography, and manufacturing methods thereof
AGC INC2 citations72
US11698580B2Jul 11, 2023
Reflective mask blank for EUV lithography
AGC INC2 citations71
US12216398B2Feb 4, 2025
Reflective mask blank and reflective mask
AGC INC0 citations62
US11914283B2Feb 27, 2024
Reflective mask blank and reflective mask
AGC INC0 citations62
US12038685B2Jul 16, 2024
Reflective mask blank for EUV lithography
AGC INC0 citations61
US12298660B2May 13, 2025
Reflective mask blank for EUV lithography, reflective mask for EUV lithography, and method for manufacturing same
AGC INC0 citations59
US11953822B2Apr 9, 2024
Reflective mask blank for EUV lithography, reflective mask for EUV lithography, and method for manufacturing same
AGC INC0 citations59
US11982935B2May 14, 2024
Reflective mask blank for EUV lithography
AGC INC0 citations57
US12124164B2Oct 22, 2024
Reflective mask blank and reflective mask
AGC INC0 citations56
US11036127B2Jun 15, 2021
Reflective mask blank and reflective mask
AGC INC0 citations50
ASAHI GLASS CO LTD
9 patentsUS7230695B2Jun 12, 2007
Defect repair device and defect repair method
ASAHI GLASS CO LTD10 citations84
US8029950B2Oct 4, 2011
Reflective mask blank for EUV lithography
ASAHI GLASS CO LTD13 citations83
US7960077B2Jun 14, 2011
Reflective-type mask blank for EUV lithography
ASAHI GLASS CO LTD11 citations83
US7678511B2Mar 16, 2010
Reflective-type mask blank for EUV lithography
ASAHI GLASS CO LTD6 citations73
US10254640B2Apr 9, 2019
Reflective element for mask blank and process for producing reflective element for mask blank
ASAHI GLASS CO LTD3 citations72
US7712333B2May 11, 2010
Method for smoothing a surface of a glass substrate for a reflective mask blank used in EUV lithography
ASAHI GLASS CO LTD2 citations61
US9097976B2Aug 4, 2015
Reflective mask blank for EUV lithography
ASAHI GLASS CO LTD1 citations51
US9086629B2Jul 21, 2015
Substrate with conductive film, substrate with multilayer reflective film and reflective mask blank for EUV lithography
ASAHI GLASS CO LTD1 citations51
US6383695B1May 7, 2002
Black matrix for liquid crystal display devices and color filter
ASAHI GLASS CO LTD1 citations51
MURATA MACHINERY LTD
3 patentsUS5588602ADec 31, 1996
Package changing system for supplying and discharging loaded and empty packages to and from a machine frame
MURATA MACHINERY LTD6 citations73
US4888945ADec 26, 1989
Method for quality control of textured yarn
MURATA MACHINERY LTD7 citations73
US4993219AFeb 19, 1991
False twist processing apparatus
MURATA MACHINERY LTD3 citations62