Inventor

ECHIGO MASATOSHI

JP63 patents

⚠️ This page may combine multiple inventors who share the name “ECHIGO MASATOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ECHIGO MASATOSHI

MITSUBISHI GAS CHEMICAL CO

Resist composition and method for forming resist pattern

Resist composition

Resist composition, method for forming resist pattern, polyphenol derivative for use in the composition

Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom

Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom

Curing epoxy resin with aliphatic diamine-styrene product and carboxyl- and hydroxyl-containing accelerator

Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, and resist pattern forming method

Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming method

Amino composition and process for producing the same

Compound, resist composition, and method for forming resist pattern using it

Resist base material, resist composition and method for forming resist pattern

Compound, resin, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, resist pattern forming method, circuit pattern forming method, and purification method

Modified chain aliphatic polyamine

Epoxy resin curing agent of aliphatic diamine/styrene addition product

Process for producing an amino composition

Modified polyoxyalkylene polyamine

Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, pattern forming method, resin, and purification method

Compound, resin, composition, resist pattern formation method, and circuit pattern formation method

(Meth)acryloyl compound and method for producing same

Compound and method for producing same

Resist material, resist composition and method for forming resist pattern

Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and method for purifying the compound or resin

Compound for resist and radiation-sensitive composition

Compound for resist and radiation-sensitive composition

Modified cyclic aliphatic polyamine

Resist composition, method for forming resist pattern, and polyphenol compound used therein

Cyclic compound, method for producing the same, radiation-sensitive composition, and resist pattern formation method

Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin

Process for producing an amino composition

Compound, resin, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and method for purifying compound or resin

Compound, composition, and method for producing same, underlayer film forming material for lithography, composition for underlayer film formation for lithography, and purification method

Radiation-sensitive composition

Allyl compound and method for producing the same

Material for forming film for lithography, composition for forming film for lithography, film for lithography, pattern forming method and purification method

Method for purifying compound or resin

Compound, material for forming underlayer film for lithography, underlayer film for lithography and pattern forming method

ECHIGO MASATOSHI

Cyclic compound, manufacturing method therefor, radiation-sensitive composition, and method for forming a resist pattern

Radiation-sensitive composition

Underlayer film-forming material for lithography, underlayer film for lithography, and pattern formation method

Cyclic compound, method for producing same, composition, and method for forming resist pattern

Cyclic compound, process for production of the cyclic compound, radiation-sensitive composition, and method for formation of resist pattern

Radiation-sensitive composition

Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom

HAYASHI HIROMI

Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern

Cyclic compound, method of producing the same, radiation sensitive composition, and method of forming resist pattern

MITSUBISHI GASCHEMICAL COMPANY

Modified cyclic aliphatic polyamine

TAKASUKA MASAAKI

Cyclic compound, production process thereof, radiation-sensitive composition and resist pattern formation method

HIGASHIHARA GO

Aromatic hydrocarbon resin, underlayer film forming composition for lithography, and method for forming multilayer resist pattern