Inventor

VALCORE JR JOHN C

US84 patents

⚠️ This page may combine multiple inventors who share the name “VALCORE JR JOHN C”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

VALCORE JR JOHN C

LAM RES CORP

Using modeling to determine ion energy associated with a plasma system

Sub-pulsing during a state

System, method and apparatus for RF power compensation in a plasma processing system

Systems and methods for using computer-generated models to reduce reflected power towards a high frequency RF generator during a cycle of operations of a low frequency RF generator

State-based adjustment of power and frequency

Soft pulsing

Segmenting a model within a plasma system

Systems and methods for providing characteristics of an impedance matching model for use with matching networks

Determining a malfunctioning device in a plasma system

System, method and apparatus for refining radio frequency transmission system models

Control of etch rate using modeling, feedback and impedance match

Impedance-based adjustment of power and frequency

Adjustment of power and frequency based on three or more states

Systems and methods for tuning an impedance matching network in a step-wise fashion for multiple states of an RF generator

Computation of statistics for statistical data decimation

Computation of statistics for statistical data decimation

Using modeling for identifying a location of a fault in an RF transmission system for a plasma system

Adjustment of power and frequency based on three or more states

Systems and methods for tuning an impedance matching network in a step-wise fashion

Segmenting a model within a plasma system

Systems and methods for tuning an impedance matching network in a step-wise fashion

Systems and methods for tuning an impedance matching network in a step-wise fashion

Sub-pulsing during a state

Adjustment of power and frequency based on three or more states

Methods and apparatus for controlling plasma in a plasma processing system

Systems and methods for increasing efficiency of delivered power of a megahertz radio frequency generator in the presence of a kilohertz radio frequency generator

Sub-pulsing during a state

Impedance-based adjustment of power and frequency

Systems and methods for using one or more fixtures and efficiency to determine parameters of a match network model

Systems and methods for using multiple inductive and capacitive fixtures for applying a variety of plasma conditions to determine a match network model

Sub-pulsing during a state

Dual push between a host computer system and an RF generator

System, method and apparatus for improving accuracy of RF transmission models for selected portions of an RF transmission path

Dual control modes

Frequency enhanced impedance dependent power control for multi-frequency RF pulsing

Frequency enhanced impedance dependent power control for multi-frequency RF pulsing

Edge ramping

System, method and apparatus for using optical data to monitor RF generator operations

Arrangement for plasma processing system control based on RF voltage

Multiple control modes

RF impedance model based fault detection

VALCORE JR JOHN C

Determining a value of a variable on an RF transmission model

Methods and apparatus for controlling plasma in a plasma processing system

Methods and apparatus for synchronizing RF pulses in a plasma processing system

Edge ramping

State-based adjustment of power and frequency

Impedance-based adjustment of power and frequency

Methods and apparatus for detecting the confinement state of plasma in a plasma processing system

Plasma processing system control based on RF voltage

Using modeling to determine wafer bias associated with a plasma system