Inventor

HOFFMAN DANIEL J

US115 patents

⚠️ This page may combine multiple inventors who share the name “HOFFMAN DANIEL J”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HOFFMAN DANIEL J

APPLIED MATERIALS INC

Merie plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression

Plasma reactor with overhead RF electrode tuned to the plasma

Method of plasma load impedance tuning by modulation of an unmatched low power RF generator

Capacitively coupled plasma reactor with magnetic plasma control

Plasma reactor with overhead RF source power electrode with low loss, low arcing tendency and low contamination

Plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression

Capacitively coupled plasma reactor with uniform radial distribution of plasma

Plasma reactor overhead source power electrode with low arcing tendency, cylindrical gas outlets and shaped surface

Plasma reactor with a multiple zone thermal control feed forward control apparatus

Method of operating a plasma reactor chamber with respect to two plasma parameters selected from a group comprising ion density, wafer voltage, etch rate and wafer current, by controlling chamber parameters of source power and bias power

MERIE plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression

Temperature control system for process chamber

Substrate support having heat transfer system

Plasma reactor with high speed plasma load impedance tuning by modulation of different unmatched frequency sources

Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of a source power or bias power RF generator

Method of determining plasma ion density, wafer voltage, etch rate and wafer current from applied bias voltage and current

Plasma density, energy and etch rate measurements at bias power input and real time feedback control of plasma source and bias power

Method for agile workpiece temperature control in a plasma reactor using a thermal model

Method of plasma confinement for enhancing magnetic control of plasma radial distribution

Dual bias frequency plasma reactor with feedback control of E.S.C. voltage using wafer voltage measurement at the bias supply output

Method for determining plasma characteristics

ADVANCED ENERGY IND INC

System, method, and apparatus for controlling ion energy distribution in plasma processing systems

Method for controlling ion energy distribution

Wide dynamic range ion energy bias control; fast ion energy switching; ion energy control and a pulsed bias supply; and a virtual front panel

Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution system

Systems, methods, and apparatus for minimizing cross coupled wafer surface potentials

Electrostatic remote plasma source system and method

Capacitively coupled remote plasma source

HOFFMAN DANIEL J

System, method and apparatus for controlling ion energy distribution of a projected plasma

Remote plasma source generating a disc-shaped plasma

Electrostatic remote plasma source

Systems and methods for calibrating a switched mode ion energy distribution system

Plasma reactor with overhead RF electrode tuned to the plasma

Physical vapor deposition reactor with circularly symmetric RF feed and DC feed to the sputter target

BUCHBERGER JR DOUGLAS A

Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes

Method of processing a workpiece in a plasma reactor using feed forward thermal control

Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loops

Capacitively coupled plasma reactor having very agile wafer temperature control

Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes

BROUK VICTOR

Method of controlling the switched mode ion energy distribution system

Method of controlling the switched mode ion energy distribution system

System, method and apparatus for controlling ion energy distribution

Wafer chucking system for advanced plasma ion energy processing systems

BOEING CO

Titanium-polymer hybrid laminates

Titanium-polymer hybrid laminates

CARTER DANIEL

Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution system

BERA KALLOL

Plasma reactor apparatus with multiple gas injection zones having time-changing separate configurable gas compositions for each zone

(unassigned)

Capacitively coupled plasma reactor with magnetic plasma control

BRILLHART PAUL LUKAS

Plasma reactor with a multiple zone thermal control feed forward control apparatus

MARTIN MARIETTA ENERGY SYSTEMS

Method and apparatus for radio frequency ceramic sintering