Inventor
VAN MEER JOHANNES M
US19 patents
⚠️ This page may combine multiple inventors who share the name “VAN MEER JOHANNES M”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
11 patentsUS11205593B2Dec 21, 2021
Asymmetric fin trimming for fins of FinFET device
APPLIED MATERIALS INC2 citations72
US11942361B2Mar 26, 2024
Semiconductor device cavity formation using directional deposition
APPLIED MATERIALS INC2 citations71
US12369299B2Jul 22, 2025
Devices and methods for DRAM leakage reduction
APPLIED MATERIALS INC0 citations62
US12300494B2May 13, 2025
Ion implantation process to form punch through stopper
APPLIED MATERIALS INC0 citations62
US11948832B2Apr 2, 2024
Bottom implant and airgap isolation for nanosheet semiconductor devices
APPLIED MATERIALS INC0 citations62
US12096622B2Sep 17, 2024
Directional etch for improved dual deck three-dimensional NAND architecture margin
APPLIED MATERIALS INC0 citations61
US11424164B2Aug 23, 2022
Enhanced etch resistance for insulator layers implanted with low energy ions
APPLIED MATERIALS INC0 citations61
US12230691B2Feb 18, 2025
Three dimensional device formation using early removal of sacrificial heterostructure layer
APPLIED MATERIALS INC0 citations60
US11626284B2Apr 11, 2023
Method of forming a 2-dimensional channel material, using ion implantation
APPLIED MATERIALS INC0 citations57
US12463038B2Nov 4, 2025
Carbon and boron implantation for backside chemical mechanical planarization control
APPLIED MATERIALS INC0 citations50
US11778832B2Oct 3, 2023
Wordline contact formation in NAND devices
APPLIED MATERIALS INC0 citations50
GLOBALFOUNDRIES INC
6 patentsUS8962441B2Feb 24, 2015
Transistor device with improved source/drain junction architecture and methods of making such a device
GLOBALFOUNDRIES INC2 citations62
US9437740B2Sep 6, 2016
Epitaxially forming a set of fins in a semiconductor device
GLOBALFOUNDRIES INC2 citations61
US9178053B2Nov 3, 2015
Transistor device with improved source/drain junction architecture and methods of making such a device
GLOBALFOUNDRIES INC0 citations51
US9034737B2May 19, 2015
Epitaxially forming a set of fins in a semiconductor device
GLOBALFOUNDRIES INC1 citations51
US9136330B2Sep 15, 2015
Shallow trench isolation
GLOBALFOUNDRIES INC1 citations50
US9231079B1Jan 5, 2016
Stress memorization techniques for transistor devices
GLOBALFOUNDRIES INC1 citations43