P

Inventor

XU PING

CN74 patents
⚠️ This page may combine multiple inventors who share the name “XU PING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

APPLIED MATERIALS INC

17 patents
US6794311B2Sep 21, 2004

Method and apparatus for treating low k dielectric layers to reduce diffusion

APPLIED MATERIALS INC260 citations99
US6764958B1Jul 20, 2004

Method of depositing dielectric films

APPLIED MATERIALS INC314 citations98
US6656837B2Dec 2, 2003

Method of eliminating photoresist poisoning in damascene applications

APPLIED MATERIALS INC285 citations98
US6890850B2May 10, 2005

Method of depositing dielectric materials in damascene applications

APPLIED MATERIALS INC92 citations97
US6035803AMar 14, 2000

Method and apparatus for controlling the deposition of a fluorinated carbon film

APPLIED MATERIALS INC94 citations96
US6759327B2Jul 6, 2004

Method of depositing low k barrier layers

APPLIED MATERIALS INC38 citations95
US6553932B2Apr 29, 2003

Reduction of plasma edge effect on plasma enhanced CVD processes

APPLIED MATERIALS INC51 citations93
US6734102B2May 11, 2004

Plasma treatment for copper oxide reduction

APPLIED MATERIALS INC39 citations92
US6699784B2Mar 2, 2004

Method for depositing a low k dielectric film (K>3.5) for hard mask application

APPLIED MATERIALS INC42 citations91
US7151053B2Dec 19, 2006

Method of depositing dielectric materials including oxygen-doped silicon carbide in damascene applications

APPLIED MATERIALS INC8 citations73
US7117064B2Oct 3, 2006

Method of depositing dielectric films

APPLIED MATERIALS INC5 citations73
US7001850B2Feb 21, 2006

Method of depositing dielectric films

APPLIED MATERIALS INC7 citations73
US6849562B2Feb 1, 2005

Method of depositing a low k dielectric barrier film for copper damascene application

APPLIED MATERIALS INC10 citations73
US7034409B2Apr 25, 2006

Method of eliminating photoresist poisoning in damascene applications

APPLIED MATERIALS INC5 citations72
US6777171B2Aug 17, 2004

Fluorine-containing layers for damascene structures

APPLIED MATERIALS INC12 citations71
US6868856B2Mar 22, 2005

Enhanced remote plasma cleaning

APPLIED MATERIALS INC9 citations70
US7125813B2Oct 24, 2006

Method of depositing low K barrier layers

APPLIED MATERIALS INC2 citations62

XU PING

7 patents

UNIV SHANGHAI JIAOTONG

7 patents

SEIKO EPSON CORP

6 patents

GORE & ASS

3 patents

NITTO DENKO CORP

2 patents

CYPRESS SEMICONDUCTOR CORP

2 patents

MULDER MITCH

1 patent

GORE ENTERPRISE HOLDINGS INC

1 patent

NATIONAL UNIV OF DEFENSE TECHNOLOGY

1 patent

CHIA TAI TIANQING PHARMACEUTICAL GROUP CO LTD

1 patent

KIEKERT AG

1 patent

SAUVE ANTHONY

1 patent

Showing the top 50 of 74 patents by PatentIndex Score.