Inventor

SHERO ERIC

US55 patents

⚠️ This page may combine multiple inventors who share the name “SHERO ERIC”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHERO ERIC

ASM IP HOLDING BV

Deposition of metal borides

Chamber sealing member

Silane and borane treatments for titanium carbide films

Silane or borane treatment of metal thin films

Chamber sealing member

Semiconductor reaction chamber showerhead

Showerhead assembly and components thereof

Silane or borane treatment of metal thin films

Titanium aluminum and tantalum aluminum thin films

Silane and borane treatments for titanium carbide films

Gas supply manifold and method of supplying gases to chamber using same

Semiconductor reaction chamber showerhead

Vapor flow control apparatus for atomic layer deposition

Deposition of metal borides and silicides

Radiation shielding for a substrate holder

Process feed management for semiconductor substrate processing

Titanium aluminum and tantalum aluminum thin films

Methods of vapor deposition with multiple vapor sources

Methods for forming a polycrystalline molybdenum film over a surface of a substrate and related structures including a polycrystalline molybdenum film

Titanium aluminum and tantalum aluminum thin films

Methods and apparatus for stabilizing vanadium compounds

Titanium aluminum and tantalum aluminum thin films

Showerhead assembly and components thereof

Methods and systems for forming a layer comprising vanadium and nitrogen

Methods for depositing a titanium aluminum carbide film structure on a substrate and related semiconductor structures

ASM INC

Process feed management for semiconductor substrate processing

Heat lamps for zone heating

Pulsed valve manifold for atomic layer deposition

Reaction system for growing a thin film

ALD of metal silicate films

Selective etching of reactor surfaces

ASM INT

Method for controlling the sublimation of reactants

System for controlling the sublimation of reactants

Low temperature method of forming a gate stack with a high k layer deposited over an interfacial oxide layer

SHERO ERIC

Semiconductor processing reactor and components thereof

Systems and methods for thin-film deposition of metal oxides using excited nitrogen—oxygen species

Reactive site deactivation against vapor deposition

FONDURULIA KYLE

Precursor delivery system

Precursor delivery system

Precursor delivery system

DUNN TODD

Pulsed valve manifold for atomic layer deposition

Susceptor heater shim

WHITE CARL L

Gap maintenance for opening to process chamber

Vapor flow control apparatus for atomic layer deposition

VERGHESE MOHITH

Reaction system for growing a thin film

Reaction system for growing a thin film

TUOMINEN MARKO

System for controlling the sublimation of reactants

PETTINGER FRED

Process feed management for semiconductor substrate processing

POMAREDE CHRISTOPHE

Multiple vapor sources for vapor deposition

WANG CHANG-GONG

Doping with ALD technology