Inventor

MATSUURA GOH

US3 patents

⚠️ This page may combine multiple inventors who share the name “MATSUURA GOH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

IBM

2 patents

US9711365B2Jul 18, 2017

Etch rate enhancement for a silicon etch process through etch chamber pretreatment

IBM3 citations70

US8928124B2Jan 6, 2015

High aspect ratio and reduced undercut trench etch process for a semiconductor substrate

IBM2 citations60

FULLER NICHOLAS C M

1 patent

US8652969B2Feb 18, 2014

High aspect ratio and reduced undercut trench etch process for a semiconductor substrate

FULLER NICHOLAS C M6 citations80