P

Inventor

TADOKORO MASAHIDE

JP26 patents
⚠️ This page may combine multiple inventors who share the name “TADOKORO MASAHIDE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

20 patents
US12123778B2Oct 22, 2024

Thermal imaging sensor for integration into track system

TOKYO ELECTRON LTD2 citations72
US11062899B2Jul 13, 2021

Coated film removing apparatus

TOKYO ELECTRON LTD3 citations66
US7643126B2Jan 5, 2010

Method of setting focus condition at time of exposure, apparatus for setting focus condition at time of exposure, program, and computer readable recording medium

TOKYO ELECTRON LTD2 citations63
US12051587B2Jul 30, 2024

Substrate processing apparatus, estimation method of substrate processing and recording medium

TOKYO ELECTRON LTD0 citations62
US7985516B2Jul 26, 2011

Substrate processing method, computer-readable storage medium and substrate processing system

TOKYO ELECTRON LTD2 citations62
US7968260B2Jun 28, 2011

Substrate processing method, computer-readable storage medium, and substrate processing system

TOKYO ELECTRON LTD4 citations62
US7957828B2Jun 7, 2011

Temperature setting method for thermal processing plate, temperature setting apparatus for thermal processing plate, and computer-readable storage medium

TOKYO ELECTRON LTD6 citations62
US7910863B2Mar 22, 2011

Temperature setting method of thermal processing plate, computer-readable recording medium recording program thereon, and temperature setting apparatus for thermal processing plate

TOKYO ELECTRON LTD4 citations62
US7902485B2Mar 8, 2011

Temperature setting method of thermal processing plate, temperature setting apparatus of thermal processing plate, program, and computer-readable recording medium recording program thereon

TOKYO ELECTRON LTD4 citations62
US7715952B2May 11, 2010

Temperature setting of thermal processing plate using zernike coefficients

TOKYO ELECTRON LTD2 citations62
US11637031B2Apr 25, 2023

Systems and methods for spin process video analysis during substrate processing

TOKYO ELECTRON LTD0 citations61
US11474028B2Oct 18, 2022

Systems and methods for monitoring one or more characteristics of a substrate

TOKYO ELECTRON LTD0 citations61
US7420650B2Sep 2, 2008

Method of setting processing condition in photolithography process, apparatus for setting processing condition in photolithography process, program, and computer readable recording medium

TOKYO ELECTRON LTD1 citations52
US12467742B2Nov 11, 2025

Film thickness analysis method, film thickness analysis device and storage medium

TOKYO ELECTRON LTD0 citations51
US12228390B2Feb 18, 2025

Information processing apparatus, information processing method and computer-readable recording medium

TOKYO ELECTRON LTD0 citations51
US11703459B2Jul 18, 2023

System and method to calibrate a plurality of wafer inspection system (WIS) modules

TOKYO ELECTRON LTD0 citations51
US10649335B2May 12, 2020

Substrate processing apparatus, substrate processing method and storage medium

TOKYO ELECTRON LTD0 citations51
US11809091B2Nov 7, 2023

Substrate processing apparatus and processing condition adjustment method

TOKYO ELECTRON LTD0 citations50
US7867674B2Jan 11, 2011

Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such program

TOKYO ELECTRON LTD0 citations41
US9899243B2Feb 20, 2018

Light irradiation apparatus

TOKYO ELECTRON LTD0 citations39

TADOKORO MASAHIDE

4 patents

OGATA KUNIE

1 patent

JYOUSAKA MEGUMI

1 patent