Inventor
ISEKI TOMOHIRO
JP24 patents
⚠️ This page may combine multiple inventors who share the name “ISEKI TOMOHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
16 patentsUS8043657B2Oct 25, 2011
Coating treatment method
TOKYO ELECTRON LTD11 citations84
US7820243B2Oct 26, 2010
Resist coating method and resist coating apparatus
TOKYO ELECTRON LTD9 citations84
US9690202B2Jun 27, 2017
Developing method, developing apparatus and storage medium
TOKYO ELECTRON LTD2 citations72
US9649577B2May 16, 2017
Bubble removing method, bubble removing apparatus, degassing apparatus, and computer-readable recording medium
TOKYO ELECTRON LTD2 citations68
US7906173B2Mar 15, 2011
Resist coating method and resist coating apparatus
TOKYO ELECTRON LTD3 citations63
US10901320B2Jan 26, 2021
Developing method, developing apparatus, and computer-readable recording medium
TOKYO ELECTRON LTD0 citations62
US7520936B2Apr 21, 2009
Hardening processing apparatus, hardening processing method, and coating film forming apparatus
TOKYO ELECTRON LTD6 citations62
US7479190B2Jan 20, 2009
Coating treatment apparatus and coating treatment method
TOKYO ELECTRON LTD4 citations62
US10211050B2Feb 19, 2019
Method for photo-lithographic processing in semiconductor device manufacturing
TOKYO ELECTRON LTD1 citations61
US10606177B2Mar 31, 2020
Substrate processing apparatus, substrate processing method, and storage medium
TOKYO ELECTRON LTD0 citations52
US8851011B2Oct 7, 2014
Coating treatment method, coating treatment apparatus, and computer-readable storage medium
TOKYO ELECTRON LTD0 citations52
US10120286B2Nov 6, 2018
Developing method, developing apparatus, and computer-readable recording medium
TOKYO ELECTRON LTD0 citations51
US9952512B2Apr 24, 2018
Developing method, developing apparatus, and computer-readable storage medium
TOKYO ELECTRON LTD1 citations51
US7832352B2Nov 16, 2010
Coating treatment method and coating treatment apparatus
TOKYO ELECTRON LTD0 citations51
US9627232B2Apr 18, 2017
Substrate processing method, substrate processing apparatus and non-transitory storage medium
TOKYO ELECTRON LTD0 citations42
US9899243B2Feb 20, 2018
Light irradiation apparatus
TOKYO ELECTRON LTD0 citations39
YOSHIHARA KOUSUKE
5 patentsUS8414972B2Apr 9, 2013
Coating treatment method, coating treatment apparatus, and computer-readable storage medium
YOSHIHARA KOUSUKE5 citations84
US8505479B2Aug 13, 2013
Resist coating apparatus
YOSHIHARA KOUSUKE2 citations62
US8496991B2Jul 30, 2013
Coating treatment method
YOSHIHARA KOUSUKE3 citations62
US8318247B2Nov 27, 2012
Coating treatment method, coating treatment apparatus, and computer-readable storage medium
YOSHIHARA KOUSUKE2 citations62
US8225738B2Jul 24, 2012
Resist coating method and resist coating apparatus
YOSHIHARA KOUSUKE4 citations62