Inventor

TU CHIH-CHIANG

TW76 patents

⚠️ This page may combine multiple inventors who share the name “TU CHIH-CHIANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TU CHIH-CHIANG

TAIWAN SEMICONDUCTOR MFG CO LTD

Apparatus and method for e-beam writing

Pellicle removal method

Semiconductor mask blanks with a compatible stop layer

Pellicle having vent hole

Reflection mode photomask and method of making

Reflection mode photomask

Reflection mode photomask and fabrication method therefore

System and method for performing spin dry etching

Photomask having a plurality of shielding layers

Method and system to prepare, manufacture and inspect mask patterns for a semiconductor device

Mask blank and mask and fabrication method thereof

Image mask film scheme and method

Mask defect prevention

Mask and method of forming the same

Mask, method of forming the same and method of manufacturing a semiconductor device using the same

Reflection mode photomask

System and method for performing spin dry etching

Photomask having a plurality of shielding layers

Photomask having a plurality of shielding layers

Mask overlay control

Mask blank for scattering effect reduction

EUV source with rotation crucible and laser and tin (SN) auto-filling method

Extreme ultraviolet (EUV) radiation source apparatus, EUV lithography system, and method for generating extreme ultraviolet radiation

Mask and photolithography system

Mask defect prevention

TAIWAN SEMICONDUCTOR MFG

Method and system of mask data preparation for curvilinear mask patterns for a device

Optical proximity correction during wafer processing through subfile bias modification with subsequent subfile merging

Process to fabricate a double layer attenuated phase shift mask (APSM) with chrome border

Attenuated phase shift mask and method of manufacture thereof

Solving line-end shortening and corner rounding problems by using a simple checking rule

Method of forming multiple layer attenuating phase shifting masks

Method of forming multiple layer attenuating phase shifting masks

Type mask for combining off axis illumination and attenuating phase shifting mask patterns

Method of making attenuating phase-shifting mask using different exposure doses

Method of blind border pattern layout for attenuated phase shifting masks

Using (LaNiO3)X (TiO2)1-x oxide absorption composite for attenuating phase shifting blanks and masks

Three-dimensional semiconductor image reconstruction apparatus and method

Three-dimensional semiconductor image reconstruction apparatus and method

Line edge and size definition in e-beam exposure

Semiconductor mask blanks with a compatible stop layer

Image mask film scheme and method

TU CHIH-CHIANG

Semiconductor mask blanks with a compatible stop layer

Method for manufacturing photovoltaic device

Method for forming photovoltaic cell, and resulting photovoltaic cell

Mask making decision for manufacturing (DFM) on mask quality control

LIN CHIN-HSIANG

Lithographic plane check for mask processing

Cost-effective method for extreme ultraviolet (EUV) mask production

ONG BIOW-HIEM

Rendered database image-to-inspection image optimization for inspection

Systems and methods eliminating false defect detections

CHANG HSIAO CHIH

Superimpose photomask and method of patterning