Inventor
CHEN CHUN-LANG
TW48 patents
⚠️ This page may combine multiple inventors who share the name “CHEN CHUN-LANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
33 patentsUS9953833B2Apr 24, 2018
Semiconductor mask blanks with a compatible stop layer
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations83
US11735421B2Aug 22, 2023
Reflection mode photomask and method of making
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11270884B2Mar 8, 2022
Reflection mode photomask
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10553428B2Feb 4, 2020
Reflection mode photomask and fabrication method therefore
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10276426B2Apr 30, 2019
System and method for performing spin dry etching
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10095102B2Oct 9, 2018
Photomask having a plurality of shielding layers
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US9921467B2Mar 20, 2018
Mask blank and mask and fabrication method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US9581894B2Feb 28, 2017
Image mask film scheme and method
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US11662656B2May 30, 2023
Mask and method of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations70
US10845698B2Nov 24, 2020
Mask, method of forming the same and method of manufacturing a semiconductor device using the same
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations70
US9373551B2Jun 21, 2016
Moveable and adjustable gas injectors for an etching chamber
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations69
US12176211B2Dec 24, 2024
Reflection mode photomask
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US11854861B2Dec 26, 2023
System and method for performing spin dry etching
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US11531263B2Dec 20, 2022
Photomask having a plurality of shielding layers
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US11099476B2Aug 24, 2021
Photomask having a plurality of shielding layers
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US9017903B2Apr 28, 2015
Mask overlay control
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations62
US8999611B2Apr 7, 2015
Mask blank for scattering effect reduction
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations62
US12066757B2Aug 20, 2024
Mask and method of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US10969682B2Apr 6, 2021
Apparatus and method for developing a photoresist coated substrate
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations59
US10698313B2Jun 30, 2020
Apparatus and method for developing a photoresist coated substrate
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations59
US10670956B2Jun 2, 2020
Photomask having a plurality of shielding layers
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10012899B2Jul 3, 2018
Graphene pellicle for extreme ultraviolet lithography
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10007176B2Jun 26, 2018
Graphene pellicle for extreme ultraviolet lithography
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations52
US9513542B2Dec 6, 2016
Lithography mask and method of forming a lithography mask
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9202947B2Dec 1, 2015
Photovoltaic device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US11086211B2Aug 10, 2021
Masks and methods of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10852634B2Dec 1, 2020
Phase shifter mask
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10678126B2Jun 9, 2020
Semiconductor mask blanks with a compatible stop layer
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10345692B2Jul 9, 2019
Photomask and a fabrication method therefor
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10156783B2Dec 18, 2018
Image mask film scheme and method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US9377701B2Jun 28, 2016
Mask overlay control
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations51
US9829786B2Nov 28, 2017
PSM blank for enhancing small size CD resolution
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations49
US10157805B2Dec 18, 2018
Moveable and adjustable gas injectors for an etching chamber
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations48
TAIWAN SEMICONDUCTOR MFG
6 patentsUS9142423B2Sep 22, 2015
Semiconductor mask blanks with a compatible stop layer
TAIWAN SEMICONDUCTOR MFG1 citations62
US9122175B2Sep 1, 2015
Image mask film scheme and method
TAIWAN SEMICONDUCTOR MFG2 citations62
US7043327B2May 9, 2006
Lithography apparatus and method employing non-environmental variable correction
TAIWAN SEMICONDUCTOR MFG6 citations61
US9057961B2Jun 16, 2015
Systems and methods for lithography masks
TAIWAN SEMICONDUCTOR MFG0 citations52
US7871742B2Jan 18, 2011
Method for controlling phase angle of a mask by post-treatment
TAIWAN SEMICONDUCTOR MFG0 citations52
US7368229B2May 6, 2008
Composite layer method for minimizing PED effect
TAIWAN SEMICONDUCTOR MFG1 citations52
TU CHIH-CHIANG
5 patentsUS8715890B2May 6, 2014
Semiconductor mask blanks with a compatible stop layer
TU CHIH-CHIANG87 citations96
US8563351B2Oct 22, 2013
Method for manufacturing photovoltaic device
TU CHIH-CHIANG5 citations84
US8981557B2Mar 17, 2015
Method for forming photovoltaic cell, and resulting photovoltaic cell
TU CHIH-CHIANG2 citations62
US8293645B2Oct 23, 2012
Method for forming photovoltaic cell
TU CHIH-CHIANG1 citations52
US8785083B2Jul 22, 2014
Systems and methods for lithography masks
TU CHIH-CHIANG0 citations51