Inventor
BRINGOLTZ BARAK
IL28 patents
⚠️ This page may combine multiple inventors who share the name “BRINGOLTZ BARAK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KLA TENCOR CORP
19 patentsUS9739702B2Aug 22, 2017
Symmetric target design in scatterometry overlay metrology
KLA TENCOR CORP31 citations92
US9958385B2May 1, 2018
Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology
KLA TENCOR CORP9 citations84
US9784987B2Oct 10, 2017
Apodization for pupil imaging scatterometry
KLA TENCOR CORP5 citations84
US10591406B2Mar 17, 2020
Symmetric target design in scatterometry overlay metrology
KLA TENCOR CORP6 citations82
US9581430B2Feb 28, 2017
Phase characterization of targets
KLA TENCOR CORP15 citations82
US10203200B2Feb 12, 2019
Analyzing root causes of process variation in scatterometry metrology
KLA TENCOR CORP7 citations81
US9851300B1Dec 26, 2017
Decreasing inaccuracy due to non-periodic effects on scatterometric signals
KLA TENCOR CORP12 citations80
US10533940B2Jan 14, 2020
Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology
KLA TENCOR CORP2 citations73
US9869543B2Jan 16, 2018
Reducing algorithmic inaccuracy in scatterometry overlay metrology
KLA TENCOR CORP4 citations73
US9091650B2Jul 28, 2015
Apodization for pupil imaging scatterometry
KLA TENCOR CORP5 citations73
US10415963B2Sep 17, 2019
Estimating and eliminating inter-cell process variation inaccuracy
KLA TENCOR CORP2 citations72
US10261014B2Apr 16, 2019
Near field metrology
KLA TENCOR CORP2 citations71
US9903711B2Feb 27, 2018
Feed forward of metrology data in a metrology system
KLA TENCOR CORP5 citations71
US9874527B2Jan 23, 2018
Removing process-variation-related inaccuracies from scatterometry measurements
KLA TENCOR CORP3 citations71
US10234280B2Mar 19, 2019
Reflection symmetric scatterometry overlay targets and methods
KLA TENCOR CORP1 citations62
US10126238B2Nov 13, 2018
Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology
KLA TENCOR CORP0 citations52
US9726984B2Aug 8, 2017
Aperture alignment in scatterometry metrology systems
KLA TENCOR CORP0 citations50
US9909982B2Mar 6, 2018
Pupil plane calibration for scatterometry overlay measurement
KLA TENCOR CORP1 citations47
US11862522B2Jan 2, 2024
Accuracy improvements in optical metrology
KLA TENCOR CORP0 citations44
NOVA LTD
7 patentsUS11763181B2Sep 19, 2023
Metrology and process control for semiconductor manufacturing
NOVA LTD3 citations68
US12321102B2Jun 3, 2025
Machine and deep learning methods for spectra-based metrology and process control
NOVA LTD0 citations59
US11815819B2Nov 14, 2023
Machine and deep learning methods for spectra-based metrology and process control
NOVA LTD0 citations59
US12236364B2Feb 25, 2025
Metrology and process control for semiconductor manufacturing
NOVA LTD0 citations58
US11874606B2Jan 16, 2024
System and method for controlling measurements of sample's parameters
NOVA LTD0 citations46
US12547082B2Feb 10, 2026
Combining physical modeling and machine learning
NOVA LTD0 citations44
US12038271B2Jul 16, 2024
Detecting outliers and anomalies for OCD metrology machine learning
NOVA LTD0 citations42