Inventor

LILL THORSTEN

US84 patents

⚠️ This page may combine multiple inventors who share the name “LILL THORSTEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LILL THORSTEN

LAM RES CORP

Dry plasma etch method to pattern MRAM stack

Isotropic atomic layer etch for silicon and germanium oxides

Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch)

Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch)

Method to etch non-volatile metal materials

Method to etch non-volatile metal materials

Dry plasma etch method to pattern MRAM stack

Integrating atomic scale processes: ALD (atomic layer deposition) and ale (atomic layer etch)

Atomic layer etching of tungsten and other metals

Ion beam etching utilizing cryogenic wafer temperatures

Use of ion beam etching to generate gate-all-around structure

Ion injector and lens system for ion beam milling

Cobalt etch back

Internal plasma grid for semiconductor fabrication

Ion injector and lens system for ion beam milling

Dry plasma etch method to pattern MRAM stack

Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch)

Active showerhead

Internal plasma grid for semiconductor fabrication

Controlling ion energy within a plasma chamber

ALE smoothness: in and outside semiconductor industry

Ion injector and lens system for ion beam milling

Controlling ion energy within a plasma chamber

Cobalt etch back

Differentially pumped reactive gas injector

Differentially pumped reactive gas injector

Chamber for patterning non-volatile metals

Atomic layer etching of AL2O3 using a combination of plasma and vapor treatments

Sulfur doped carbon hard masks

Thermal atomic layer etch with rapid temperature cycling

Ion beam etching utilizing cryogenic wafer temperatures

Ion beam etch without need for wafer tilt or rotation

Ion beam etch without need for wafer tilt or rotation

Active showerhead

Atomic layer etching 3D structures: Si and SiGe and Ge smoothness on horizontal and vertical surfaces

Atomic layer etching methods and apparatus

APPLIED MATERIALS INC

Ceramic article with reduced surface defect density and process for producing a ceramic article

Process for control of the shape of the etch front in the etching of polysilicon

Plasma reactor with dry clean apparatus and method

Methodology for in-situ and real-time chamber condition monitoring and process recovery during plasma processing

Apparatus for plasma etching at a constant etch rate

Method and apparatus for monitoring and controlling wafer fabrication process

Method for in situ removal of a dielectric antireflective coating during a gate etch process

Stable plasma process for etching of films

Method for controlling the shape of the etch front in the etching of polysilicon

Plasma density and etch rate enhancing semiconductor processing chamber

Pulsed plasma with low wafer temperature for ultra thin layer etches

Methods of forming silicon nitride spacers

Integrated method for removal of halogen residues from etched substrates in a processing system

(unassigned)

Method of micromachining a multi-part cavity