Inventor
WATANABE JUN
JP292 patents
⚠️ This page may combine multiple inventors who share the name “WATANABE JUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
14 patentsUS6440634B1Aug 27, 2002
Onium salts, photoacid generators for resist compositions, resist compositions, and patterning process
SHINETSU CHEMICAL CO76 citations96
US6878501B2Apr 12, 2005
Polymer, chemically amplified resist composition and patterning process
SHINETSU CHEMICAL CO31 citations93
US6710148B2Mar 23, 2004
Polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO20 citations93
US6692893B2Feb 17, 2004
Onium salts, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO29 citations93
US6623909B2Sep 23, 2003
Polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO38 citations93
US6579658B2Jun 17, 2003
Polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO29 citations93
US6551758B2Apr 22, 2003
Onium salts, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO25 citations93
US6511787B2Jan 28, 2003
Polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO25 citations93
US6455223B1Sep 24, 2002
Resist compositions and patterning process
SHINETSU CHEMICAL CO28 citations93
US6416928B1Jul 9, 2002
Onium salts, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO41 citations93
US6414101B1Jul 2, 2002
Dendritic polymers and making method
SHINETSU CHEMICAL CO20 citations93
US6338931B1Jan 15, 2002
Resist compositions and patterning process
SHINETSU CHEMICAL CO35 citations93
US6593056B2Jul 15, 2003
Chemically amplified positive resist composition and patterning method
SHINETSU CHEMICAL CO26 citations92
US6395446B1May 28, 2002
Resist compositions and patterning process
SHINETSU CHEMICAL CO24 citations92
FUJI PHOTO FILM CO LTD
6 patentsUS6693746B1Feb 17, 2004
Anti-glare and anti-reflection film, polarizing plate, and image display device
FUJI PHOTO FILM CO LTD132 citations98
US6917400B2Jul 12, 2005
Anti-reflection film, polarizing plate comprising the same, and image display device using the anti-reflection film or the polarizing plate
FUJI PHOTO FILM CO LTD81 citations97
US6791649B1Sep 14, 2004
Anti-reflection film, polarizing plate comprising the same, and image display device using the anti-reflection film or the polarizing plate
FUJI PHOTO FILM CO LTD71 citations97
US6559915B1May 6, 2003
Optical films having matt property, films having a high transmittance, polarizing plates and liquid crystal display devices
FUJI PHOTO FILM CO LTD59 citations96
US5646703AJul 8, 1997
Liquid crystal display
FUJI PHOTO FILM CO LTD74 citations93
US6888593B1May 3, 2005
Anti-glare and anti-reflection film, polarizing plate, and image display device
FUJI PHOTO FILM CO LTD20 citations92
NEC CORP
4 patentsFUJITSU LTD
2 patentsDAICEL CHEM
2 patentsUS6191250B1Feb 20, 2001
Processes for the preparation of a monodisperse polymers, processes for the continuous polymerization of cyclic monomers, and polymers prepared thereby
DAICEL CHEM58 citations96
US6593434B1Jul 15, 2003
Preparing polyester block copolymer with excess unreacted lactones to be removed
DAICEL CHEM20 citations93
RICOH KK
2 patentsHITACHI LTD
2 patentsNISSAN MOTOR
2 patentsBRIDGESTONE CORP
2 patentsSONY CORP
1 patentYANMAR CO LTD
1 patentTOSHIBA STORAGE DEVICE CORP
1 patentTOYO COMMUNICATION EQUIP
1 patentSHIMADZU CORP
1 patentSAISHO KENICHIROH
1 patentNIHON MICROCOATING CO LTD
1 patentTOSHIBA KK
1 patentDENKI KAGAKU KOGYO KK
1 patentTOYO KOGYO CO
1 patentSHIN ESTU CHEMICAL CO LTD
1 patentCARL MFG CO
1 patentFUJI HEAVY IND LTD
1 patentSEIKO EPSON CORP
1 patentShowing the top 50 of 292 patents by PatentIndex Score.