Inventor

CHENG CHUNG-I

TW2 patents

Patents

2 patents

US6206760B1Mar 27, 2001

Method and apparatus for preventing particle contamination in a polishing machine

TAIWAN SEMICONDUCTOR MFG42 citations86

US6561877B1May 13, 2003

Apparatus and method for retaining moisture on a polishing pad

TAIWAN SEMICONDUCTOR MFG0 citations31