Inventor

YAGIHASHI FUJIO

JP38 patents

⚠️ This page may combine multiple inventors who share the name “YAGIHASHI FUJIO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

YAGIHASHI FUJIO

SHINETSU CHEMICAL CO

Organic silicon oxide core-shell particles and preparation method thereof, porous film-forming composition, porous film and formation method thereof, and semiconductor device

Antireflective film material, and antireflective film and pattern formation method using the same

Antireflective film material, and antireflective film and pattern formation method using the same

Coating solution and method for forming dielectric film

Positive resist material and pattern formation method using the same

Semiconductor device comprising porous film

Binder composition and aqueous coating composition

Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device

Water-resistant ink composition and writing instrument

Sulfonium salt and chemically amplified positive resist composition

Tristertbutoxyphenyl sulfonium tosylate compound

Poly(para-T-butoxycarbonyloxystyrene) and method of making

Resist compositions

Onium salts and positive resist materials using the same

Chemically amplified positive resist composition

Polymer having a narrow dispersion of molecular weight and a manufacturing process thereof

Porous-film-forming composition, preparation method of the composition, porous film and semiconductor device

Silicon-containing resist underlayer film-forming composition and patterning process

Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device

Film forming composition, porous film and their preparation

Tertiary butyl 4,4-bis(4′-hydroxyphenyl) pentanoate derivatives and positive resist materials containing the same

P-vinylphenoxydimethylphenylcarbyldimethylsilane homopolymer

Method for finishing treatment of a fabric material

Method for forming insulating film with low dielectric constant

Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD

Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device

Composition for forming porous film, porous film and method for forming the same, interlevel insulator film

Porous film, composition and manufacturing method, interlayer dielectric film, and semiconductor device

Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device

Composition for forming a porous film prepared by hydrolysis and condensation of an alkoxysilane using a trialkylmethylammonium hydroxide catalyst

Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device

Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device

Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device

SANKEI YAKUHIN KK

Cephalosporin derivatives

OGIHARA TSUTOMU

Composition for forming resist underlayer film and patterning process using the same

HAMADA YOSHITAKA

High-temperature bonding composition, substrate bonding method, and 3-D semiconductor device

AIST

Silanol compound and method for producing silanol compound

YAGIHASHI FUJIO

Substrate joining method and 3-D semiconductor device