Inventor
IANIRO MICHAEL R
US4 patents
Patents
4 patentsUS7112123B2Sep 26, 2006
Chemical-mechanical polishing (CMP) slurry containing clay and CeO2 abrasive particles and method of planarizing surfaces
AMCOL INTERNATIONAL CORP30 citations89
US7087529B2Aug 8, 2006
Chemical-mechanical polishing (CMP) slurry and method of planarizing surfaces
AMCOL INTERNATIONAL CORP11 citations81
US7267784B2Sep 11, 2007
Chemical-mechanical polishing (CMP) slurry and method of planarizing computer memory disk surfaces
AMCOL INTERNATIONAL CORP4 citations59
US7223156B2May 29, 2007
Method chemical-mechanical polishing and planarizing corundum, GaAs, GaP and GaAs/GaP alloy surfaces
AMCOL INTERNATIONAL CORP2 citations59