P

Inventor

SEO KANG-ILL

US104 patents
⚠️ This page may combine multiple inventors who share the name “SEO KANG-ILL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SAMSUNG ELECTRONICS CO LTD

45 patents
US9601569B1Mar 21, 2017

Semiconductor device having a gate all around structure

SAMSUNG ELECTRONICS CO LTD23 citations94
US9425259B1Aug 23, 2016

Semiconductor device having a fin

SAMSUNG ELECTRONICS CO LTD21 citations93
US9397179B1Jul 19, 2016

Semiconductor device

SAMSUNG ELECTRONICS CO LTD19 citations93
US6642107B2Nov 4, 2003

Non-volatile memory device having self-aligned gate structure and method of manufacturing same

SAMSUNG ELECTRONICS CO LTD30 citations92
US11881455B2Jan 23, 2024

Through silicon buried power rail implemented backside power distribution network semiconductor architecture and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD5 citations84
US9755034B2Sep 5, 2017

Semiconductor device having nanowire

SAMSUNG ELECTRONICS CO LTD13 citations84
US9614068B2Apr 4, 2017

Semiconductor device and method of fabricating the same

SAMSUNG ELECTRONICS CO LTD15 citations84
US9443978B2Sep 13, 2016

Semiconductor device having gate-all-around transistor and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD7 citations84
US9343370B1May 17, 2016

Method for fabricating semiconductor device

SAMSUNG ELECTRONICS CO LTD9 citations84
US9209179B2Dec 8, 2015

FinFET-based semiconductor device with dummy gates

SAMSUNG ELECTRONICS CO LTD14 citations84
US8927373B2Jan 6, 2015

Methods of fabricating non-planar transistors including current enhancing structures

SAMSUNG ELECTRONICS CO LTD9 citations84
US9735157B1Aug 15, 2017

Semiconductor device and method of fabricating the same

SAMSUNG ELECTRONICS CO LTD15 citations82
US9679965B1Jun 13, 2017

Semiconductor device having a gate all around structure and a method for fabricating the same

SAMSUNG ELECTRONICS CO LTD11 citations81
US6573139B2Jun 3, 2003

Method of fabricating cell of flash memory device

SAMSUNG ELECTRONICS CO LTD10 citations74
US11502167B2Nov 15, 2022

Semiconductor device having stepped multi-stack transistor structure

SAMSUNG ELECTRONICS CO LTD4 citations73
US9923058B2Mar 20, 2018

Semiconductor device having a fin

SAMSUNG ELECTRONICS CO LTD2 citations73
US9905559B2Feb 27, 2018

Semiconductor device having fin-type field effect transistor and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD3 citations73
US9875791B2Jan 23, 2018

Semiconductor device

SAMSUNG ELECTRONICS CO LTD2 citations73
US9754660B2Sep 5, 2017

Semiconductor device

SAMSUNG ELECTRONICS CO LTD2 citations73
US9735153B2Aug 15, 2017

Semiconductor device having fin-type field effect transistor and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD2 citations73
US9653462B2May 16, 2017

Semiconductor device and method for fabricating the same

SAMSUNG ELECTRONICS CO LTD5 citations73
US9472653B2Oct 18, 2016

Method for fabricating semiconductor device

SAMSUNG ELECTRONICS CO LTD3 citations73
US9362311B1Jun 7, 2016

Method of fabricating semiconductor device

SAMSUNG ELECTRONICS CO LTD4 citations73
US9257327B2Feb 9, 2016

Methods of forming a Field Effect Transistor, including forming a region providing enhanced oxidation

SAMSUNG ELECTRONICS CO LTD4 citations73
US12356665B2Jul 8, 2025

Stacked transistors having an isolation region therebetween and a common gate electrode, and related fabrication methods

SAMSUNG ELECTRONICS CO LTD2 citations72
US12170322B2Dec 17, 2024

Devices including stacked nanosheet transistors

SAMSUNG ELECTRONICS CO LTD2 citations72
US9570434B2Feb 14, 2017

Semiconductor device and fabricating method thereof

SAMSUNG ELECTRONICS CO LTD3 citations72
US12230571B2Feb 18, 2025

Integrated circuit devices including a power rail and methods of forming the same

SAMSUNG ELECTRONICS CO LTD3 citations71
US12125788B2Oct 22, 2024

Through silicon buried power rail implemented backside power distribution network semiconductor architecture and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD2 citations71
US12230570B2Feb 18, 2025

Integrated circuit with buried power rail and methods of manufacturing the same

SAMSUNG ELECTRONICS CO LTD0 citations63
US12119351B2Oct 15, 2024

Semiconductor device having fin-type field effect transistor and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD0 citations63
US11233008B2Jan 25, 2022

Method of manufacturing an integrated circuit with buried power rail

SAMSUNG ELECTRONICS CO LTD1 citations63
US11177260B2Nov 16, 2021

Semiconductor device having fin-type field effect transistor and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD0 citations63
US10790278B2Sep 29, 2020

Semiconductor device including vertical field effect transistors having different gate lengths

SAMSUNG ELECTRONICS CO LTD1 citations63
US12543347B2Feb 3, 2026

Different diffusion break structures for three-dimensional stacked semiconductor device

SAMSUNG ELECTRONICS CO LTD0 citations62
US12464803B2Nov 4, 2025

Multi-fin vertical field effect transistor and single-fin vertical field effect transistor on a single integrated circuit chip

SAMSUNG ELECTRONICS CO LTD0 citations62
US12389660B1Aug 12, 2025

Semiconductor device including backside contact structure with silicide layer formed in FEOL process

SAMSUNG ELECTRONICS CO LTD0 citations62
US12317588B2May 27, 2025

Step-stacked nanowire CMOS structure for low power logic device and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD0 citations62
US12317582B2May 27, 2025

Integrated circuit devices including a metal resistor and methods of forming the same

SAMSUNG ELECTRONICS CO LTD0 citations62
US12310062B2May 20, 2025

Integrated circuit devices including stacked transistors and methods of forming the same

SAMSUNG ELECTRONICS CO LTD0 citations62
US12310106B2May 20, 2025

Devices including stacked nanosheet transistors

SAMSUNG ELECTRONICS CO LTD0 citations62
US12274092B2Apr 8, 2025

Resistance measuring structures of stacked devices

SAMSUNG ELECTRONICS CO LTD0 citations62
US12199152B2Jan 14, 2025

Selective single diffusion/electrical barrier

SAMSUNG ELECTRONICS CO LTD0 citations62
US12183786B2Dec 31, 2024

Multi-stack semiconductor device with zebra nanosheet structure

SAMSUNG ELECTRONICS CO LTD0 citations62
US12094869B2Sep 17, 2024

Diode structures of stacked devices and methods of forming the same

SAMSUNG ELECTRONICS CO LTD0 citations62

KIM DONG-KWON

1 patent

MING LI

1 patent

SEO KANG-ILL

1 patent

SUK SUNG-DAE

1 patent

SEO KANG ILL

1 patent

Showing the top 50 of 104 patents by PatentIndex Score.