Inventor
VALAYIL SILVESTER P
17 patents
⚠️ This page may combine multiple inventors who share the name “VALAYIL SILVESTER P”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
M & T CHEMICALS INC
10 patentsUS4009087AFeb 22, 1977
Electrodeposition of copper
M & T CHEMICALS INC67 citations95
US4036711AJul 19, 1977
Electrodeposition of copper
M & T CHEMICALS INC34 citations92
US4036710AJul 19, 1977
Electrodeposition of copper
M & T CHEMICALS INC24 citations81
US3956078AMay 11, 1976
Electrodeposition of copper
M & T CHEMICALS INC21 citations81
US3956079AMay 11, 1976
Electrodeposition of copper
M & T CHEMICALS INC9 citations73
US3956120AMay 11, 1976
Electrodeposition of copper
M & T CHEMICALS INC8 citations73
US3956084AMay 11, 1976
Electrodeposition of copper
M & T CHEMICALS INC16 citations73
US3940320AFeb 24, 1976
Electrodeposition of copper
M & T CHEMICALS INC18 citations73
US4014760AMar 29, 1977
Electrodeposition of copper
M & T CHEMICALS INC2 citations62
US3966565AJun 29, 1976
Electrodeposition of copper
M & T CHEMICALS INC1 citations51
DART IND INC
4 patentsUS4236957ADec 2, 1980
Dissolution of metals utilizing an aqueous H2 SOY --H2 O.sub. -mercapto containing heterocyclic nitrogen etchant
DART IND INC18 citations81
US4233111ANov 11, 1980
Dissolution of metals utilizing an aqueous H2 SO4 -H2 O2 -3-sulfopropyldithiocarbamate etchant
DART IND INC8 citations72
US4233113ANov 11, 1980
Dissolution of metals utilizing an aqueous H2 O2 -H2 SO4 -thioamide etchant
DART IND INC9 citations72
US4233112ANov 11, 1980
Dissolution of metals utilizing an aqueous H2 SO4 -H2 O2 -polysulfide etchant
DART IND INC3 citations61