Inventor
MAKU SHINGO
JP3 patents
Patents
3 patentsUS7094708B2Aug 22, 2006
Method of CVD for forming silicon nitride film on substrate
TOKYO ELECTRON LTD38 citations90
US7509962B2Mar 31, 2009
Method and control system for treating a hafnium-based dielectric processing system
TOKYO ELECTRON LTD7 citations71
US7125812B2Oct 24, 2006
CVD method and device for forming silicon-containing insulation film
TOKYO ELECTRON LTD8 citations71