Inventor

HSIEH CHEN-HAO

TW2 patents

Patents

2 patents

US6720116B1Apr 13, 2004

Process flow and pellicle type for 157 nm mask making

TAIWAN SEMICONDUCTOR MFG17 citations82

US6830702B2Dec 14, 2004

Single trench alternating phase shift mask fabrication

TAIWAN SEMICONDUCTOR MFG4 citations60