Inventor
FREDERICKS EDWARD C
US8 patents
Patents
8 patentsUS5192708AMar 9, 1993
Sub-layer contact technique using in situ doped amorphous silicon and solid phase recrystallization
IBM44 citations92
US4564584AJan 14, 1986
Photoresist lift-off process for fabricating semiconductor devices
IBM48 citations92
US4125650ANov 14, 1978
Resist image hardening process
IBM33 citations91
US5087537AFeb 11, 1992
Lithography imaging tool and related photolithographic processes
IBM55 citations87
US4567132AJan 28, 1986
Multi-level resist image reversal lithography process
IBM33 citations87
US4640738AFeb 3, 1987
Semiconductor contact protection
IBM24 citations79
US4464458AAug 7, 1984
Process for forming resist masks utilizing O-quinone diazide and pyrene
IBM10 citations72
US4745045AMay 17, 1988
Method for improving resolution in microelectronic circuits using photoresist overlayer by using thermally processed polyimide underlayer formed from positive photoresist and polyamic acid
IBM17 citations71