Inventor
SETHURAMAN ANANTHA R
US21 patents
⚠️ This page may combine multiple inventors who share the name “SETHURAMAN ANANTHA R”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CYPRESS SEMICONDUCTOR CORP
8 patentsUS6232231B1May 15, 2001
Planarized semiconductor interconnect topography and method for polishing a metal layer to form interconnect
CYPRESS SEMICONDUCTOR CORP49 citations94
US5972124AOct 26, 1999
Method for cleaning a surface of a dielectric material
CYPRESS SEMICONDUCTOR CORP55 citations93
US6302766B1Oct 16, 2001
System for cleaning a surface of a dielectric material
CYPRESS SEMICONDUCTOR CORP20 citations89
US6361415B1Mar 26, 2002
Employing an acidic liquid and an abrasive surface to polish a semiconductor topography
CYPRESS SEMICONDUCTOR CORP5 citations73
US6200896B1Mar 13, 2001
Employing an acidic liquid and an abrasive surface to polish a semiconductor topography
CYPRESS SEMICONDUCTOR CORP13 citations73
US6143663ANov 7, 2000
Employing deionized water and an abrasive surface to polish a semiconductor topography
CYPRESS SEMICONDUCTOR CORP15 citations73
US6849946B2Feb 1, 2005
Planarized semiconductor interconnect topography and method for polishing a metal layer to form interconnect
CYPRESS SEMICONDUCTOR CORP10 citations72
US6566249B1May 20, 2003
Planarized semiconductor interconnect topography and method for polishing a metal layer to form wide interconnect structures
CYPRESS SEMICONDUCTOR CORP1 citations51
RODEL INC
6 patentsUS5738800AApr 14, 1998
Composition and method for polishing a composite of silica and silicon nitride
RODEL INC117 citations98
US5756398AMay 26, 1998
Composition and method for polishing a composite comprising titanium
RODEL INC52 citations96
US6218305B1Apr 17, 2001
Composition and method for polishing a composite of silica and silicon nitride
RODEL INC72 citations95
US6132637AOct 17, 2000
Composition and method for polishing a composite of silica and silicon nitride
RODEL INC44 citations95
US6042741AMar 28, 2000
Composition for polishing a composite of silica and silicon nitride
RODEL INC74 citations95
US6001269ADec 14, 1999
Method for polishing a composite comprising an insulator, a metal, and titanium
RODEL INC48 citations92
APPLIED MATERIALS INC
6 patentsUS10579041B2Mar 3, 2020
Semiconductor process control method
APPLIED MATERIALS INC7 citations81
US10481199B2Nov 19, 2019
Data analytics and computational analytics for semiconductor process control
APPLIED MATERIALS INC2 citations70
US11187992B2Nov 30, 2021
Predictive modeling of metrology in semiconductor processes
APPLIED MATERIALS INC0 citations60
US10579769B2Mar 3, 2020
Using design proximity index and effect-to-design proximity ratio to control semiconductor processes and achieve enhanced yield
APPLIED MATERIALS INC1 citations60
US11088039B2Aug 10, 2021
Data management and mining to correlate wafer alignment, design, defect, process, tool, and metrology data
APPLIED MATERIALS INC0 citations46
US10614262B2Apr 7, 2020
Method of predicting areas of vulnerable yield in a semiconductor substrate
APPLIED MATERIALS INC0 citations35