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Inventor
NOMURA ASUKA
US
2 patents
Patents
2 patents
US7279386B2
Oct 9, 2007
Method for forming a semiconductor arrangement with gate sidewall spacers of specific dimensions
ADVANCED MICRO DEVICES INC
3 citations
58
US7144785B2
Dec 5, 2006
Method of forming isolation trench with spacer formation
ADVANCED MICRO DEVICES INC
2 citations
58