Inventor
YATES DONALD L
US67 patents
Patents
50 patentsUS6562726B1May 13, 2003
Acid blend for removing etch residue
MICRON TECHNOLOGY INC117 citations98
US6350322B1Feb 26, 2002
Method of reducing water spotting and oxide growth on a semiconductor structure
MICRON TECHNOLOGY INC65 citations97
US6783695B1Aug 31, 2004
Acid blend for removing etch residue
MICRON TECHNOLOGY INC52 citations96
US6762132B1Jul 13, 2004
Compositions for dissolution of low-K dielectric films, and methods of use
MICRON TECHNOLOGY INC51 citations96
US6703319B1Mar 9, 2004
Compositions and methods for removing etch residue
MICRON TECHNOLOGY INC63 citations96
US6673675B2Jan 6, 2004
Methods of fabricating an MRAM device using chemical mechanical polishing
MICRON TECHNOLOGY INC44 citations96
US6656289B2Dec 2, 2003
Method of reducing water spotting and oxide growth on a semiconductor structure
MICRON TECHNOLOGY INC23 citations96
US6517738B1Feb 11, 2003
Acid blend for removing etch residue
MICRON TECHNOLOGY INC55 citations96
US6486108B1Nov 26, 2002
Cleaning composition useful in semiconductor integrated circuit fabrication
MICRON TECHNOLOGY INC41 citations96
US6453914B2Sep 24, 2002
Acid blend for removing etch residue
MICRON TECHNOLOGY INC63 citations96
US6316370B1Nov 13, 2001
Method for etching doped polysilicon with high selectivity to undoped polysilicon
MICRON TECHNOLOGY INC47 citations96
US6012469AJan 11, 2000
Etch residue clean
MICRON TECHNOLOGY INC68 citations96
US5939336AAug 17, 1999
Aqueous solutions of ammonium fluoride in propylene glycol and their use in the removal of etch residues from silicon substrates
MICRON TECHNOLOGY INC49 citations96
US7148555B2Dec 12, 2006
Method for enhancing electrode surface area in DRAM cell capacitors
MICRON TECHNOLOGY INC12 citations93
US6794704B2Sep 21, 2004
Method for enhancing electrode surface area in DRAM cell capacitors
MICRON TECHNOLOGY INC24 citations93
US6743641B2Jun 1, 2004
Method of improving surface planarity prior to MRAM bit material deposition
MICRON TECHNOLOGY INC32 citations93
US6656372B2Dec 2, 2003
Methods of making magnetoresistive memory devices
MICRON TECHNOLOGY INC35 citations93
US6645311B2Nov 11, 2003
Method of reducing water spotting and oxide growth on a semiconductor structure
MICRON TECHNOLOGY INC18 citations93
US6641677B1Nov 4, 2003
Method of reducing water spotting and oxide growth on a semiconductor structure
MICRON TECHNOLOGY INC18 citations93
US6607001B1Aug 19, 2003
System of reducing water spotting and oxide growth on a semiconductor structure
MICRON TECHNOLOGY INC17 citations93
US6601595B2Aug 5, 2003
Method of reducing water spotting and oxide growth on a semiconductor structure
MICRON TECHNOLOGY INC19 citations93
US6573554B2Jun 3, 2003
Localized masking for semiconductor structure development
MICRON TECHNOLOGY INC13 citations93
US6358793B1Mar 19, 2002
Method for localized masking for semiconductor structure development
MICRON TECHNOLOGY INC30 citations93
US6192899B1Feb 27, 2001
Etch residue clean with aqueous HF/organic solution
MICRON TECHNOLOGY INC24 citations93
US6090721AJul 18, 2000
Aqueous solutions of ammonium fluoride in propylene glycol and their use in the removal of etch residues from silicon substrates
MICRON TECHNOLOGY INC24 citations93
US7285811B2Oct 23, 2007
MRAM device for preventing electrical shorts during fabrication
MICRON TECHNOLOGY INC12 citations84
US7119388B2Oct 10, 2006
MRAM device fabricated using chemical mechanical polishing
MICRON TECHNOLOGY INC11 citations84
US6867148B2Mar 15, 2005
Removal of organic material in integrated circuit fabrication using ozonated organic acid solutions
MICRON TECHNOLOGY INC14 citations84
US6639266B1Oct 28, 2003
Modifying material removal selectivity in semiconductor structure development
MICRON TECHNOLOGY INC19 citations84
US7521373B2Apr 21, 2009
Compositions for dissolution of low-k dielectric films, and methods of use
MICRON TECHNOLOGY INC3 citations74
US7422639B2Sep 9, 2008
Method of reducing water spotting and oxide growth on a semiconductor structure
MICRON TECHNOLOGY INC3 citations74
US7312159B2Dec 25, 2007
Compositions for dissolution of low-k dielectric films, and methods of use
MICRON TECHNOLOGY INC3 citations74
US7204889B2Apr 17, 2007
Method of reducing water spotting and oxide growth on a semiconductor structure
MICRON TECHNOLOGY INC3 citations74
US7163019B2Jan 16, 2007
Method of reducing water spotting and oxide growth on a semiconductor structure
MICRON TECHNOLOGY INC5 citations74
US7135444B2Nov 14, 2006
Cleaning composition useful in semiconductor integrated circuit fabrication
MICRON TECHNOLOGY INC6 citations74
US7018937B2Mar 28, 2006
Compositions for removal of processing byproducts and method for using same
MICRON TECHNOLOGY INC5 citations74
US7015529B2Mar 21, 2006
Localized masking for semiconductor structure development
MICRON TECHNOLOGY INC5 citations74
US6896740B2May 24, 2005
Method of reducing water spotting and oxide growth on a semiconductor structure
MICRON TECHNOLOGY INC6 citations74
US6864186B1Mar 8, 2005
Method of reducing surface contamination in semiconductor wet-processing vessels
MICRON TECHNOLOGY INC10 citations74
US6833084B2Dec 21, 2004
Etching compositions
MICRON TECHNOLOGY INC6 citations74
US7307306B2Dec 11, 2007
Etch mask and method of forming a magnetic random access memory structure
MICRON TECHNOLOGY INC5 citations70
US7642157B2Jan 5, 2010
Method for enhancing electrode surface area in DRAM cell capacitors
MICRON TECHNOLOGY INC3 citations63
US7573121B2Aug 11, 2009
Method for enhancing electrode surface area in DRAM cell capacitors
MICRON TECHNOLOGY INC1 citations63
US7468534B2Dec 23, 2008
Localized masking for semiconductor structure development
MICRON TECHNOLOGY INC1 citations63
US7432214B2Oct 7, 2008
Compositions for dissolution of low-k dielectric film, and methods of use
MICRON TECHNOLOGY INC1 citations63
US7419768B2Sep 2, 2008
Methods of fabricating integrated circuitry
MICRON TECHNOLOGY INC3 citations63
US7399424B2Jul 15, 2008
Compositions for dissolution of low-k dielectric films, and methods of use
MICRON TECHNOLOGY INC2 citations63
US7384727B2Jun 10, 2008
Semiconductor processing patterning methods
MICRON TECHNOLOGY INC2 citations63
US7375388B2May 20, 2008
Device having improved surface planarity prior to MRAM bit material deposition
MICRON TECHNOLOGY INC2 citations63
US7261835B2Aug 28, 2007
Acid blend for removing etch residue
MICRON TECHNOLOGY INC2 citations63
Showing the top 50 of 67 patents by PatentIndex Score.