Inventor
HOFSAESS MARKUS
DE4 patents
⚠️ This page may combine multiple inventors who share the name “HOFSAESS MARKUS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
INFINEON TECHNOLOGIES AG
3 patentsUS6730463B2May 4, 2004
Method for determining and removing phase conflicts on alternating phase masks
INFINEON TECHNOLOGIES AG29 citations90
US6680151B2Jan 20, 2004
Alternating phase mask
INFINEON TECHNOLOGIES AG14 citations82
US7393614B2Jul 1, 2008
Set of masks including a first mask and a second trimming mask with a semitransparent region having a transparency between 20% and 80% to control diffraction effects and obtain maximum depth of focus for the projection of structure patterns onto a semiconductor wafer
INFINEON TECHNOLOGIES AG3 citations60