Inventor

AOYAMA TETSUO

JP36 patents

⚠️ This page may combine multiple inventors who share the name “AOYAMA TETSUO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

AOYAMA TETSUO

MITSUBISHI GAS CHEMICAL CO

Active carbon materials, process for the preparation thereof and the use thereof

Resist stripping composition

Cleaning liquid for semiconductor devices

Cleaning liquid for semiconductor devices

Surface treating agent for aluminum line pattern substrate

Photoresist removing composition

Stripping and cleaning agent for removing dry-etching and photoresist residues from a semiconductor substrate, and a method for forming a line pattern using the stripping and cleaning agent

Resist stripping agent and process of producing semiconductor devices using the same

Active carbon materials, process for the preparation thereof and the use thereof

Positive type photoresist developer

Method of producing semiconductor device and rinse for cleaning semiconductor device

Removing agent composition for a photoresist and process for producing a semiconductor integrated circuit

Process for production of quaternary ammonium hydroxides

Process for preparation of tertiary olefins

Method for preparing aqueous quaternary ammonium hydroxide solution

Process for the preparation of carboxylic acid esters

Process for producing dimethyl formamide

Process for preparing hydroperoxide

Developing solution for producing printed circuit boards and a process for producing printed circuit boards wherein the developing solution comprises a quaternary ammonium hydroxide and a quaternary ammonium carbonate

Flux washing agent

Process for producing dimethylformamide

Process for preparing a methylphenol

Process for producing dimethyl formamide

Process for producing dimethyl formamide

SHARP KK

Cleaning agent and cleaning process using the same

Photoresist stripping composition and process for stripping photoresist

Resist film removing composition and method for manufacturing thin film circuit element using the composition

TOKYO ELECTRON LTD

Cleaning method using an oxidizing agent, chelating agent and fluorine compound

Cleaning agent and cleaning method

EKC TECHNOLOGY K K

Cleaning composition for removing resists and method of manufacturing semiconductor device

EKC TECHNOLOGY INC

Aqueous fluoride compositions for cleaning semiconductor devices

MITSUBISHI GAS CHEMICALS CO IN

Cleaning agent for use in producing semiconductor devices and process for producing semiconductor devices using the same

TEXAS INSTRUMENTS INC

Cleaning agent for a semiconductor device and a method of manufacturing a semiconductor device

MITSUBISHI ELECTRIC CORP

Method and apparatus for manufacturing semiconductor device

SONY CORP

Separation-material composition for photo-resist and manufacturing method of semiconductor device

TAGO TSUGUHIRO

Etching liquid composition