Inventor

GUTHRIE HUNG-CHIN

US38 patents

⚠️ This page may combine multiple inventors who share the name “GUTHRIE HUNG-CHIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

GUTHRIE HUNG-CHIN

HITACHI GLOBAL STORAGE TECH

Perpendicular magnetic recording write head with trailing shield having notch and throat height defined by nonmagnetic pad layer

Perpendicular magnetic write head having a magnetic write pole with a concave trailing edge

Bilayer trailing shield gap for perpendicular head

Method of manufacturing a perpendicular write head

Perpendicular head with trailing shield and rhodium gap process

Perpendicular magnetic recording head including wrap around shield with notched top write gap and method of fabricating the same

Method for fabricating thin film magnetic heads using CMP with polishing stop layer

Run-to-run control of backside pressure for CMP radial uniformity optimization based on center-to-edge model

Method for manufacturing a perpendicular magnetic write head with wrap around magnetic trailing and side shields

Methods for the manufacture of notched trailing shields

System, method, and apparatus for ion beam etching process stability using a reference for time scaling subsequent steps

Process of fabricating write pole in magnetic recording head using rhodium CMP stop layer

Reactive ion milling/RIE assisted CMP

Manufacturing method for forming a write head top pole using chemical mechanical polishing with a DLC stop layer

Run-to-run control of backside pressure for CMP radial uniformity optimization based on center-to-edge model

P1 write pole with shoulder formation

Method for making a perpendicular magnetic recording write head

Copper damascene chemical mechanical polishing (CMP) for thin film head writer fabrication

One step copper damascene CMP process and slurry

Fabricating perpendicular write elements in perpendicular magnetic recording heads

Gentle chemical mechanical polishing (CMP) liftoff process

Post chemical mechanical polishing cleaning solution for 2.45T CoFeNi structures of thin film magnetic heads

System, method, and apparatus for wetting slurry delivery tubes in a chemical mechanical polishing process to prevent clogging thereof

Methodology of chemical mechanical nanogrinding for ultra precision finishing of workpieces

Magnetic write head with gap termination less than half distance between pedestal and back gap

System and method for cleaning chemistry and processing during thin film magnetic head wafer fabrication

Chemical mechanical polishing process for 2.45T CoFeNi structures of thin film magnetic heads

CMP for corrosion-free CoFe elements for magnetic heads

Magnetic write head having a first magnetic pole with a self aligned stepped notch

Magnetic write head having a stair notched, steep shouldered pole and a write gap bump

GUTHRIE HUNG-CHIN

Method for manufacturing a perpendicular magnetic write head with a wrap around shield

Methods for fabricating a magnetic head reader using a chemical mechanical polishing (CMP) process for sensor stripe height patterning

IBM

Method of planarizing first pole piece layer of write head by lapping without delamination of first pole piece layer from wafer substrate

Endpoint detection in chemical-mechanical polishing of patterned wafers having a low pattern density

ZHENG YI

Method for manufacturing a perpendicular magnetic write head

Perpendicular magnetic write head having a novel shield structure

HITACHI GLOBAL STORAGE TECH NL

Process for self-aligned flare point and shield throat definition prior to main pole patterning

FENG JIAN-HUEI

Method for aligning wafers within wafer processing equipment