Inventor
VORONIN SERGEY
US26 patents
Patents
26 patentsUS10063062B2Aug 28, 2018
Method of detecting plasma discharge in a plasma processing system
TOKYO ELECTRON LTD40 citations94
US9779952B2Oct 3, 2017
Method for laterally trimming a hardmask
TOKYO ELECTRON LTD3 citations73
US11189462B1Nov 30, 2021
Ion stratification using bias pulses of short duration
TOKYO ELECTRON LTD3 citations72
US10903077B2Jan 26, 2021
Methods to protect nitride layers during formation of silicon germanium nano-wires in microelectronic workpieces
TOKYO ELECTRON LTD3 citations71
US10818502B2Oct 27, 2020
System and method of plasma discharge ignition to reduce surface particles
TOKYO ELECTRON LTD1 citations61
US12525437B2Jan 13, 2026
Substrate bombardment with ions having targeted mass using pulsed bias phase control
TOKYO ELECTRON LTD0 citations60
US12287578B2Apr 29, 2025
Cyclic method for reactive development of photoresists
TOKYO ELECTRON LTD0 citations60
US10651017B2May 12, 2020
Method for operation instability detection in a surface wave plasma source
TOKYO ELECTRON LTD1 citations60
US12002683B2Jun 4, 2024
Lateral etching of silicon
TOKYO ELECTRON LTD1 citations59
US12158374B2Dec 3, 2024
Time-resolved OES data collection
TOKYO ELECTRON LTD0 citations58
US12506112B2Dec 23, 2025
Method for etching of metal
TOKYO ELECTRON LTD0 citations57
US12362158B2Jul 15, 2025
Method for OES data collection and endpoint detection
TOKYO ELECTRON LTD0 citations57
US12306044B2May 20, 2025
Optical emission spectroscopy for advanced process characterization
TOKYO ELECTRON LTD0 citations57
US11637242B2Apr 25, 2023
Methods for resistive RAM (ReRAM) performance stabilization via dry etch clean treatment
TOKYO ELECTRON LTD0 citations56
US11699741B2Jul 11, 2023
Metal-containing liner process
TOKYO ELECTRON LTD0 citations51
US11651970B2May 16, 2023
Systems and methods for selective ion mass segregation in pulsed plasma atomic layer etching
TOKYO ELECTRON LTD0 citations51
US10529540B2Jan 7, 2020
Advanced methods for plasma systems operation
TOKYO ELECTRON LTD0 citations51
US12009430B2Jun 11, 2024
Method for gate stack formation and etching
TOKYO ELECTRON LTD0 citations50
US11133194B2Sep 28, 2021
Method for selective etching at an interface between materials
TOKYO ELECTRON LTD0 citations50
US10998170B2May 4, 2021
Method for ion mass separation and ion energy control in process plasmas
TOKYO ELECTRON LTD0 citations50
US10818482B2Oct 27, 2020
Methods for stability monitoring and improvements to plasma sources for plasma processing
TOKYO ELECTRON LTD0 citations50
US11398386B2Jul 26, 2022
Plasma etch processes
TOKYO ELECTRON LTD0 citations48
US10777385B2Sep 15, 2020
Method for RF power distribution in a multi-zone electrode array
TOKYO ELECTRON LTD0 citations41
US9966312B2May 8, 2018
Method for etching a silicon-containing substrate
TOKYO ELECTRON LTD0 citations41
US10115591B2Oct 30, 2018
Selective SiARC removal
TOKYO ELECTRON LTD0 citations40
US10811269B2Oct 20, 2020
Method to achieve a sidewall etch
TOKYO ELECTRON LTD0 citations39