Inventor
LU CHI-LUN
TW39 patents
⚠️ This page may combine multiple inventors who share the name “LU CHI-LUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
19 patentsUS10459353B2Oct 29, 2019
Lithography system with an embedded cleaning module
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US10067418B2Sep 4, 2018
Particle removal system and method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11003069B2May 11, 2021
High durability extreme ultraviolet photomask
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations72
US12276906B2Apr 15, 2025
Methods for cleaning lithography mask
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11378894B2Jul 5, 2022
Lithography system with an embedded cleaning module
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US9418847B2Aug 16, 2016
Lithography system and method for haze elimination
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations62
US11079669B2Aug 3, 2021
System and method for localized EUV pellicle glue removal
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US10520805B2Dec 31, 2019
System and method for localized EUV pellicle glue removal
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations60
US12493237B2Dec 9, 2025
EUV pellicle and mounting method thereof on photo mask
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations57
US11822230B2Nov 21, 2023
EUV pellicle and mounting method thereof on photo mask
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations57
US9889477B2Feb 13, 2018
Method and apparatus for enhanced cleaning and inspection
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations52
US9612523B2Apr 4, 2017
Structure and method for reflective-type mask
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US12353120B2Jul 8, 2025
EUV photo masks and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10642148B2May 5, 2020
High durability extreme ultraviolet photomask
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10156784B2Dec 18, 2018
Systems and methods of EUV mask cleaning
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10061191B2Aug 28, 2018
High durability extreme ultraviolet photomask
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US9885952B2Feb 6, 2018
Systems and methods of EUV mask cleaning
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations51
US9665000B1May 30, 2017
Method and system for EUV mask cleaning with non-thermal solution
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations51
US9740094B2Aug 22, 2017
Damage prevention on EUV mask
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50
TAIWAN SEMICONDUCTOR MFG
15 patentsUS7383530B2Jun 3, 2008
System and method for examining mask pattern fidelity
TAIWAN SEMICONDUCTOR MFG27 citations92
US7883601B2Feb 8, 2011
Apparatus and method for controlling relative particle speeds in a plasma
TAIWAN SEMICONDUCTOR MFG8 citations84
US7897008B2Mar 1, 2011
Apparatus and method for regional plasma control
TAIWAN SEMICONDUCTOR MFG6 citations74
US9046781B2Jun 2, 2015
Structure and method for reflective-type mask
TAIWAN SEMICONDUCTOR MFG2 citations62
US7312021B2Dec 25, 2007
Holographic reticle and patterning method
TAIWAN SEMICONDUCTOR MFG3 citations62
US7819980B2Oct 26, 2010
System and method for removing particles in semiconductor manufacturing
TAIWAN SEMICONDUCTOR MFG4 citations61
US7060400B2Jun 13, 2006
Method to improve photomask critical dimension uniformity and photomask fabrication process
TAIWAN SEMICONDUCTOR MFG5 citations60
US7759136B2Jul 20, 2010
Critical dimension (CD) control by spectrum metrology
TAIWAN SEMICONDUCTOR MFG4 citations59
US8888948B2Nov 18, 2014
Apparatus and method for controlling relative particle concentrations in a plasma
TAIWAN SEMICONDUCTOR MFG0 citations52
US7722997B2May 25, 2010
Holographic reticle and patterning method
TAIWAN SEMICONDUCTOR MFG0 citations52
US7697114B2Apr 13, 2010
Method and apparatus for compensated illumination for advanced lithography
TAIWAN SEMICONDUCTOR MFG1 citations52
US7316872B2Jan 8, 2008
Etching bias reduction
TAIWAN SEMICONDUCTOR MFG0 citations52
US8932958B2Jan 13, 2015
Device manufacturing and cleaning method
TAIWAN SEMICONDUCTOR MFG0 citations51
US8046860B2Nov 1, 2011
System and method for removing particles in semiconductor manufacturing
TAIWAN SEMICONDUCTOR MFG0 citations50
US7460251B2Dec 2, 2008
Dimension monitoring method and system
TAIWAN SEMICONDUCTOR MFG0 citations48