Inventor
CHIN SHENG-CHI
TW45 patents
⚠️ This page may combine multiple inventors who share the name “CHIN SHENG-CHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
20 patentsUS9835940B2Dec 5, 2017
Method to fabricate mask-pellicle system
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US9658526B2May 23, 2017
Mask pellicle indicator for haze prevention
TAIWAN SEMICONDUCTOR MFG CO LTD9 citations82
US10126644B2Nov 13, 2018
Pellicle for advanced lithography
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US9933699B2Apr 3, 2018
Pellicle aging estimation and particle removal from pellicle via acoustic waves
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10061193B2Aug 28, 2018
Focused radiation beam induced deposition
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations70
US12429776B2Sep 30, 2025
Lithography method with reduced impacts of mask defects
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10955746B2Mar 23, 2021
Lithography method with reduced impacts of mask defects
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US9418847B2Aug 16, 2016
Lithography system and method for haze elimination
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations62
US12320782B2Jun 3, 2025
Acoustic measurement of fabrication equipment clearance
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11709153B2Jul 25, 2023
Acoustic measurement of fabrication equipment clearance
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11079669B2Aug 3, 2021
System and method for localized EUV pellicle glue removal
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US10520805B2Dec 31, 2019
System and method for localized EUV pellicle glue removal
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations60
US10859908B2Dec 8, 2020
Method to fabricate mask-pellicle system
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10691017B2Jun 23, 2020
Pellicle for advanced lithography
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9889477B2Feb 13, 2018
Method and apparatus for enhanced cleaning and inspection
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations52
US9870612B2Jan 16, 2018
Method for repairing a mask
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10845342B2Nov 24, 2020
Acoustic measurement of film thickness
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10794872B2Oct 6, 2020
Acoustic measurement of fabrication equipment clearance
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US9915866B2Mar 13, 2018
Focused radiation beam induced deposition
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations49
US9910350B2Mar 6, 2018
Method for repairing a mask
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations49
TAIWAN SEMICONDUCTOR MFG
15 patentsUS6599665B1Jul 29, 2003
Method of making a semiconductor wafer imaging mask having uniform pattern features
TAIWAN SEMICONDUCTOR MFG22 citations93
US7383530B2Jun 3, 2008
System and method for examining mask pattern fidelity
TAIWAN SEMICONDUCTOR MFG27 citations92
US6428938B1Aug 6, 2002
Phase-shift mask for printing high-resolution images and a method of fabrication
TAIWAN SEMICONDUCTOR MFG17 citations84
US6830853B1Dec 14, 2004
Chrome mask dry etching process to reduce loading effect and defects
TAIWAN SEMICONDUCTOR MFG18 citations81
US9354510B2May 31, 2016
EUV mask and method for forming the same
TAIWAN SEMICONDUCTOR MFG3 citations72
US7381344B1Jun 3, 2008
Method to reduce particle level for dry-etch
TAIWAN SEMICONDUCTOR MFG5 citations63
US7312021B2Dec 25, 2007
Holographic reticle and patterning method
TAIWAN SEMICONDUCTOR MFG3 citations62
US7060400B2Jun 13, 2006
Method to improve photomask critical dimension uniformity and photomask fabrication process
TAIWAN SEMICONDUCTOR MFG5 citations60
US8906583B2Dec 9, 2014
Stacked mask
TAIWAN SEMICONDUCTOR MFG0 citations52
US7999910B2Aug 16, 2011
System and method for manufacturing a mask for semiconductor processing
TAIWAN SEMICONDUCTOR MFG1 citations52
US7722997B2May 25, 2010
Holographic reticle and patterning method
TAIWAN SEMICONDUCTOR MFG0 citations52
US7697114B2Apr 13, 2010
Method and apparatus for compensated illumination for advanced lithography
TAIWAN SEMICONDUCTOR MFG1 citations52
US7316872B2Jan 8, 2008
Etching bias reduction
TAIWAN SEMICONDUCTOR MFG0 citations52
US9152035B2Oct 6, 2015
Lithographic photomask with inclined sides
TAIWAN SEMICONDUCTOR MFG1 citations51
US8932958B2Jan 13, 2015
Device manufacturing and cleaning method
TAIWAN SEMICONDUCTOR MFG0 citations51