P

Inventor

LI LI

CN1,037 patents
⚠️ This page may combine multiple inventors who share the name “LI LI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MICRON TECHNOLOGY INC

17 patents
US7521378B2Apr 21, 2009

Low temperature process for polysilazane oxidation/densification

MICRON TECHNOLOGY INC173 citations99
US7030034B2Apr 18, 2006

Methods of etching silicon nitride substantially selectively relative to an oxide of aluminum

MICRON TECHNOLOGY INC234 citations99
US6939817B2Sep 6, 2005

Removal of carbon from an insulative layer using ozone

MICRON TECHNOLOGY INC526 citations99
US6309975B1Oct 30, 2001

Methods of making implanted structures

MICRON TECHNOLOGY INC83 citations99
US6261964B1Jul 17, 2001

Material removal method for forming a structure

MICRON TECHNOLOGY INC309 citations99
US6174785B1Jan 16, 2001

Method of forming trench isolation region for semiconductor device

MICRON TECHNOLOGY INC160 citations99
US5939333AAug 17, 1999

Silicon nitride deposition method

MICRON TECHNOLOGY INC107 citations99
US5783495AJul 21, 1998

Method of wafer cleaning, and system and cleaning solution regarding same

MICRON TECHNOLOGY INC173 citations99
US7205248B2Apr 17, 2007

Method of eliminating residual carbon from flowable oxide fill

MICRON TECHNOLOGY INC64 citations98
US6235145B1May 22, 2001

System for wafer cleaning

MICRON TECHNOLOGY INC110 citations98
US7268012B2Sep 11, 2007

Methods for fabrication of thin semiconductor assemblies including redistribution layers and packages and assemblies formed thereby

MICRON TECHNOLOGY INC49 citations96
US6599840B2Jul 29, 2003

Material removal method for forming a structure

MICRON TECHNOLOGY INC54 citations96
US6592777B2Jul 15, 2003

Manufacture and cleaning of a semiconductor

MICRON TECHNOLOGY INC24 citations96
US6461967B2Oct 8, 2002

Material removal method for forming a structure

MICRON TECHNOLOGY INC44 citations96
US6455906B2Sep 24, 2002

Gate stack structure with conductive silicide segment that has substantially etched nitride and/or oxynitride defects protruding from its sidewalls

MICRON TECHNOLOGY INC22 citations96
US6429496B1Aug 6, 2002

Ion-assisted oxidation methods and the resulting structures

MICRON TECHNOLOGY INC38 citations96
US6391794B1May 21, 2002

Composition and method for cleaning residual debris from semiconductor surfaces

MICRON TECHNOLOGY INC66 citations96

THERAVANCE INC

11 patents

MICROSOFT CORP

3 patents

NELLCOR PURITAN BENNETT LLC

2 patents

CA NAT RESEARCH COUNCIL

2 patents

LI LI

2 patents

AMGEN INC

2 patents

MAMMEN MATHAI

2 patents

FUTUREWEI TECHNOLOGIES INC

1 patent

APPLE INC

1 patent

BUDDHIKOT MILIND M

1 patent

(unassigned)

1 patent

SCHELL STEPHAN V

1 patent

ALCATEL LUCENT USA INC

1 patent

NORTEL NETWORKS LTD

1 patent

GAO ZHI GUO

1 patent

TENCENT TECH SHENZHEN CO LTD

1 patent

Showing the top 50 of 1,037 patents by PatentIndex Score.