Inventor
HIRATA ATSUKO
JP3 patents
Patents
3 patentsUS6187500B1Feb 13, 2001
Positive photoresist compositions and multilayer resist materials using same
TOKYO OHKA KOGYO CO LTD13 citations72
US6475694B2Nov 5, 2002
Positive photoresist composition comprising a phenolic compound having both an acid-decomposable group and a naphthoquinonediazide sulfonyl group
TOKYO OHKA KOGYO CO LTD4 citations61
US6939926B2Sep 6, 2005
Phenol novolak resin, production process thereof, and positive photoresist composition using the same
TOKYO OHKA KOGYO CO LTD2 citations60