Inventor

LAI KAFAI

US76 patents

⚠️ This page may combine multiple inventors who share the name “LAI KAFAI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LAI KAFAI

IBM

Printability verification by progressive modeling accuracy

Extending the range of lithographic simulation integrals

Method for evaluating the effects of multiple exposure processes in lithography

Fin design level mask decomposition for directed self assembly

Integrated circuit security

Method and recording medium of reducing chemoepitaxy directed self-assembled defects

Method for optimizing source and mask to control line width roughness and image log slope

Optical proximity correction using progressively smoothed mask shapes

Fast and accurate optical proximity correction engine for incorporating long range flare effects

Renesting interaction map into design for efficient long range calculations

Performance in model-based OPC engine utilizing efficient polygon pinning method

Reflective film interface to restore transverse magnetic wave contrast in lithographic processing

Reflective film interface to restore transverse magnetic wave contrast in lithographic processing

Incorporation of a phase map into fast model-based optical proximity correction simulation kernels to account for near and mid-range flare

Methodology for image fidelity verification

Self-aligned double patterning with spacer-merge region

Fabricating tapered semiconductor devices

Detecting hotspots in physical design layout patterns utilizing hotspot detection model with data augmentation

Method and recording medium of reducing chemoepitaxy directed self-assembled defects

Integrated circuit security

Method and recording medium of reducing chemoepitaxy directed self-assembled defects

Method to match exposure tools using a programmable illuminator

Multiple status e-fuse based non-volatile voltage control oscillator configured for process variation compensation, an associated method and an associated design structure

Apparatus and method for reducing contamination in immersion lithography

Multi-patterning techniques for fabricating an array of metal lines with different widths

Interconnect structure with fully self-aligned via pattern formation

Calibration of directed self-assembly models using programmed defects of varying topology

Simultaneous computation of multiple points on one or multiple cut lines

Performance in model-based OPC engine utilizing efficient polygon pinning method

Simultaneous computation of multiple points on one or multiple cut lines

Method for optimizing a number of kernels used in a sum of coherent sources for optical proximity correction in an optical microlithography process

Configurable geometric metasurface antenna

Self-aligned double patterning with spacer-merge region

Vertical plate capacitors exhibiting high capacitance manufactured with directed self-assembly

Reducing chemoepitaxy directed self-assembled defects

Integrated circuit security

Reconfigurable geometric metasurfaces with optically tunable materials

Electrically rotatable antennas formed from an optically tunable material

Reconfigurable geometric metasurfaces with optically tunable materials

Method for generating design rules for a lithographic mask design that includes long range flare effects

CHENG JOY

Method of forming sub-lithographic features using directed self-assembly of polymers

Method for designing optical lithography masks for directed self-assembly

Method for designing optical lithography masks for directed self-assembly

Directed self-assembly of block copolymers using segmented prepatterns

BAGHERI SAEED

Method for generating a plurality of optimized wavefronts for a multiple exposure lithographic process

Analyzing a patterning process using a model of yield

Analyzing a patterning process using a model of yield

LAI KAFAI

Reflective film interface to restore transverse magnetic wave contrast in lithographic processing

BRUNNER TIMOTHY A

Fast method to model photoresist images using focus blur and resist blur

TIRAPU-AZPIROZ JAIONE

Calculating image intensity of mask by decomposing Manhattan polygon based on parallel edge