Inventor

TSAI HSINYU

US59 patents

⚠️ This page may combine multiple inventors who share the name “TSAI HSINYU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TSAI HSINYU

IBM

Pattern decomposition for directed self assembly patterns templated by sidewall image transfer

Electrode pair fabrication using directed self assembly of diblock copolymers

Fin design level mask decomposition for directed self assembly

Method and recording medium of reducing chemoepitaxy directed self-assembled defects

Chemoepitaxy etch trim using a self aligned hard mask for metal line to via

Dielectric tone inversion materials

Dielectric tone inversion materials

Method and recording medium of reducing chemoepitaxy directed self-assembled defects

Directed self-assembly for copper patterning

Method and recording medium of reducing chemoepitaxy directed self-assembled defects

Pattern decomposition for directed self assembly patterns templated by sidewall image transfer

Graphoepitaxy directed self-assembly process for semiconductor fin formation

Local tailoring of fingers in multi-finger fin field effect transistors

Hybrid topographical and chemical pre-patterns for directed self-assembly of block copolymers

Selective dry etch for directed self assembly of block copolymers

Neutral hard mask and its application to graphoepitaxy-based directed self-assembly (DSA) patterning

Resist performance for the negative tone develop organic development process

Hybrid topographical and chemical pre-patterns for directed self-assembly of block copolymers

Two-dimensional mesh for compute-in-memory accelerator architecture

Efficient tile mapping for row-by-row convolutional neural network mapping for analog artificial intelligence network inference

Efficient tile mapping for row-by-row convolutional neural network mapping for analog artificial intelligence network inference

Reducing chemoepitaxy directed self-assembled defects

III-V CMOS co-integration

Mitigation of conductance drift in neural network resistive processing units

Tone inversion integration for phase change memory

Learning static bound management parameters for analog resistive processing unit system

Drift regularization to counteract variation in drift coefficients for analog accelerators

Neural network accelerators resilient to conductance drift

Biosensor for electrical detection of a nucleotide sequence

Reduction of surface nucleotide hybridization by optimizing a biosensor sensing surface area

Chemoepitaxy etch trim using a self aligned hard mask for metal line to via

Reduction of surface nucleotide hybridization by optimizing a biosensor sensing surface area

Placement of carbon nanotube guided by DSA patterning

Chemoepitaxy etch trim using a self aligned hard mask for metal line to via

Placement of carbon nanotube guided by DSA patterning

Electrode pair fabrication using directed self assembly of diblock copolymers

Implicit vector concatenation within 2D mesh routing

Sidewall image transfer on magnetic tunnel junction stack for magnetoresistive random-access memory patterning

Tone inversion integration for phase change memory

Directed self-assembly

Selective dry etch for directed self assembly of block copolymers

Graphene nanomesh based charge sensor

Directed self-assembly

Graphene nanomesh based charge sensor

Chemoepitaxy-based directed self assembly process with tone inversion for unidirectional wiring

GUILLORN MICHAEL A

Tone inversion of self-assembled self-aligned structures

Tone inversion of self-assembled self-aligned structures

GLOBALFOUNDRIES INC

Sublithographic Kelvin structure patterned with DSA

Sublithographic Kelvin structure patterned with DSA

AFZALI-ARDAKANI ALI

Graphene nanomesh based charge sensor