Inventor
TSIATMAS ANAGNOSTIS
GB31 patents
⚠️ This page may combine multiple inventors who share the name “TSIATMAS ANAGNOSTIS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
30 patentsUS10615084B2Apr 7, 2020
Method and apparatus to determine a patterning process parameter, associated with a change in a physical configuration, using measured pixel optical characteristic values
ASML NETHERLANDS BV9 citations92
US10546790B2Jan 28, 2020
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV7 citations92
US10453758B2Oct 22, 2019
Method and apparatus to determine a patterning process parameter using an asymmetric optical characteristic distribution portion
ASML NETHERLANDS BV9 citations92
US12142535B2Nov 12, 2024
Method and apparatus to determine a patterning process parameter using a unit cell having geometric symmetry
ASML NETHERLANDS BV2 citations84
US11784098B2Oct 10, 2023
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV3 citations84
US11145557B2Oct 12, 2021
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV5 citations84
US11101184B2Aug 24, 2021
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV2 citations84
US10811323B2Oct 20, 2020
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV4 citations82
US10488768B2Nov 26, 2019
Beat patterns for alignment on small metrology targets
ASML NETHERLANDS BV10 citations82
US10481503B2Nov 19, 2019
Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method
ASML NETHERLANDS BV2 citations73
US10782617B2Sep 22, 2020
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV4 citations72
US11947269B2Apr 2, 2024
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV2 citations71
US11143972B2Oct 12, 2021
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV1 citations71
US10983445B2Apr 20, 2021
Method and apparatus for measuring a parameter of interest using image plane detection techniques
ASML NETHERLANDS BV3 citations71
US10747122B2Aug 18, 2020
Method of measuring a parameter of a device manufacturing process, metrology apparatus, substrate, target, device manufacturing system, and device manufacturing method
ASML NETHERLANDS BV2 citations71
US10795269B2Oct 6, 2020
Method of determining a value of a parameter of interest, method of cleaning a signal containing information about a parameter of interest, device manufacturing method
ASML NETHERLANDS BV3 citations70
US12322660B2Jun 3, 2025
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV0 citations62
US11728224B2Aug 15, 2023
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV0 citations62
US11101185B2Aug 24, 2021
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV0 citations62
US11092900B2Aug 17, 2021
Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method
ASML NETHERLANDS BV0 citations62
US10677589B2Jun 9, 2020
Substrate, metrology apparatus and associated methods for a lithographic process
ASML NETHERLANDS BV1 citations62
US11710668B2Jul 25, 2023
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV0 citations61
US12468235B2Nov 11, 2025
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV0 citations60
US11604419B2Mar 14, 2023
Method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targets
ASML NETHERLANDS BV0 citations57
US11022897B2Jun 1, 2021
Method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targets
ASML NETHERLANDS BV0 citations57
US12124174B2Oct 22, 2024
Metrology method and apparatus, computer program and lithographic system
ASML NETHERLANDS BV0 citations55
US10871367B2Dec 22, 2020
Substrate, metrology apparatus and associated methods for a lithographic process
ASML NETHERLANDS BV0 citations51
US10571363B2Feb 25, 2020
Method of determining an optimal focus height for a metrology apparatus
ASML NETHERLANDS BV0 citations47
US10585048B2Mar 10, 2020
Method of determining a value of a parameter of interest of a target formed by a patterning process
ASML NETHERLANDS BV0 citations36
US10585354B2Mar 10, 2020
Method of optimizing a metrology process
ASML NETHERLANDS BV0 citations35