Inventor

ALOKOZAI FRED

US17 patents

⚠️ This page may combine multiple inventors who share the name “ALOKOZAI FRED”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ALOKOZAI FRED

ASM IP HOLDING BV

Process gas management for an inductively-coupled plasma deposition reactor

Process gas management for an inductively-coupled plasma deposition reactor

Semiconductor reaction chamber with plasma capabilities

Phase-stabilized thin films, structures and devices including the thin films, and methods of forming same

Semiconductor reaction chamber with plasma capabilities

Susceptor heater and method of heating a substrate

Method for treatment of deposition reactor

Chamber sealing member

Chamber sealing member

Methods for depositing a transition metal nitride film on a substrate by atomic layer deposition and related deposition apparatus

Multi-step method and apparatus for etching compounds containing a metal

Methods for depositing a transition metal nitride film on a substrate by atomic layer deposition and related deposition apparatus

Methods for forming a transition metal niobium nitride film on a substrate by atomic layer deposition and related semiconductor device structures

Methods for forming a transition metal niobium nitride film on a substrate by atomic layer deposition and related semiconductor device structures

Method for treatment of deposition reactor

DUNN TODD

Susceptor heater and method of heating a substrate

ALOKOZAI FRED

Process gas management for an inductively-coupled plasma deposition reactor