Inventor

KURUNCZI PETER F

US36 patents

⚠️ This page may combine multiple inventors who share the name “KURUNCZI PETER F”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KURUNCZI PETER F

APPLIED MATERIALS INC

Electrodynamic mass analysis with RF biased ion source

Scanned angled etching apparatus and techniques providing separate co-linear radicals and ions

Scanned angled etching apparatus and techniques providing separate co-linear radicals and ions

System, apparatus and method for multi-frequency resonator operation in linear accelerator

Plasma shaper to control ion flux distribution of plasma source

Ribbon beam plasma enhanced chemical vapor deposition system for anisotropic deposition of thin films

Device to control uniformity of extracted ion beam

Apparatus and techniques for substrate processing using independent ion source and radical source

Apparatus and techniques for angled etching using multielectrode extraction source

Variable thickness ion source extraction plate

Apparatus and techniques for angled etching using multielectrode extraction source

Hybrid apparatus, system and techniques for mass analyzed ion beam

Apparatus and system including high angle extraction optics

VARIAN SEMICONDUCTOR EQUIPMENT ASS INC

Electrodynamic mass analysis

Techniques for improving the performance and extending the lifetime of an ion source

Control of ion angular distribution of ion beams with hidden deflection electrode

System and methods using an inline surface engineering source

Boron implanting using a co-gas

Radio frequency extraction system for charge neutralized ion beam

Boron implanting using a co-gas

Method of cleaning an extraction electrode assembly using pulsed biasing

RF clean system for electrostatic elements

System and methods using an inline surface engineering source

Apparatus and method for mass analyzed ion beam

VARIAN SEMICONDUCTOR EQUIPMENT

Apparatus and techniques for energetic neutral beam processing

Method of improving ion beam quality in an implant system

Ion source cleaning end point detection

Method and apparatus for controlling beam current uniformity in an ion implanter

Method for implant productivity enhancement

Inductively coupled plasma flood gun using an immersed low inductance RF coil and multicusp magnetic arrangement

Method and apparatus for controlling beam current uniformity in an ion implanter

Wafer charge monitoring

KURUNCZI PETER F

Inductively coupled plasma flood gun using an immersed low inductance FR coil and multicusp magnetic arrangement

Apparatus and method for charge neutralization during processing of a workpiece

TRUSTEES STEVENS INST TECH

Monochromatic vacuum ultraviolet light source for photolithography applications based on a high-pressure microhollow cathode discharge

APPLIED MAT INC

Inductively coupled plasma apparatus with novel faraday shield