Inventor
SHISHIDO HIROAKI
JP90 patents
⚠️ This page may combine multiple inventors who share the name “SHISHIDO HIROAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HOYA CORP
31 patentsUS11762279B2Sep 19, 2023
Mask blank, method for manufacturing reflective mask, and method for manufacturing semiconductor device
HOYA CORP3 citations73
US11543744B2Jan 3, 2023
Mask blank, transfer mask, and method for manufacturing semiconductor device
HOYA CORP2 citations73
US11435662B2Sep 6, 2022
Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device
HOYA CORP3 citations73
US11281089B2Mar 22, 2022
Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device
HOYA CORP4 citations73
US11119400B2Sep 14, 2021
Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device
HOYA CORP2 citations73
US11112690B2Sep 7, 2021
Mask blank, transfer mask, and method for manufacturing semiconductor device
HOYA CORP4 citations73
US10915016B2Feb 9, 2021
Mask blank, method for manufacturing phase shift mask, and method for manufacturing semiconductor device
HOYA CORP3 citations73
US10606164B2Mar 31, 2020
Mask blank, phase shift mask, and method for manufacturing semiconductor device
HOYA CORP2 citations73
US10551734B2Feb 4, 2020
Mask blank, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor device
HOYA CORP2 citations73
US10539866B2Jan 21, 2020
Mask blank, phase-shift mask, and method of manufacturing semiconductor device
HOYA CORP2 citations73
US10481486B2Nov 19, 2019
Mask blank, phase shift mask, and method for manufacturing semiconductor device
HOYA CORP4 citations73
US10365556B2Jul 30, 2019
Mask blank, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor device
HOYA CORP2 citations73
US10180622B2Jan 15, 2019
Mask blank, phase-shift mask, method of manufacturing mask blank, method of manufacturing phase-shift mask and method of manufacturing semiconductor device
HOYA CORP2 citations73
US10146123B2Dec 4, 2018
Mask blank, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor device
HOYA CORP3 citations73
US10114281B2Oct 30, 2018
Mask blank, phase shift mask, and method for manufacturing semiconductor device
HOYA CORP4 citations73
US10101650B2Oct 16, 2018
Mask blank, transfer mask, method for manufacturing transfer mask, and method for manufacturing semiconductor device
HOYA CORP2 citations73
US10088744B2Oct 2, 2018
Mask blank, method of manufacturing phase shift mask, phase shift mask, and method of manufacturing semiconductor device
HOYA CORP4 citations73
US9625806B2Apr 18, 2017
Mask blank, phase-shift mask, and method for manufacturing the same
HOYA CORP3 citations73
US12468217B2Nov 11, 2025
Mask blank, method of manufacturing transfer mask, and method of manufacturing semiconductor device
HOYA CORP1 citations64
US12013631B2Jun 18, 2024
Mask blank, transfer mask, and method for manufacturing semiconductor device
HOYA CORP0 citations63
US11231645B2Jan 25, 2022
Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device
HOYA CORP0 citations63
US11226549B2Jan 18, 2022
Mask blank, phase shift mask, method for manufacturing thereof, and method for manufacturing semiconductor device
HOYA CORP0 citations63
US10444620B2Oct 15, 2019
Mask blank, phase-shift mask and method for manufacturing semiconductor device
HOYA CORP1 citations63
US10261409B2Apr 16, 2019
Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device
HOYA CORP1 citations63
US9140980B2Sep 22, 2015
Method of manufacturing a transfer mask and method of manufacturing a semiconductor device
HOYA CORP2 citations63
US12153338B2Nov 26, 2024
Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device
HOYA CORP0 citations62
US12007684B2Jun 11, 2024
Mask blank, method of manufacturing imprint mold, method of manufacturing transfer mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device
HOYA CORP0 citations62
US11630388B2Apr 18, 2023
Mask blank, method for manufacturing phase shift mask, and method for manufacturing semiconductor device
HOYA CORP0 citations62
US11442357B2Sep 13, 2022
Mask blank, phase-shift mask, and method of manufacturing semiconductor device
HOYA CORP0 citations62
US10942442B2Mar 9, 2021
Mask blank, phase-shift mask, and method of manufacturing semiconductor device
HOYA CORP0 citations62
US10942441B2Mar 9, 2021
Mask blank, phase shift mask, and method for manufacturing semiconductor device
HOYA CORP1 citations62
HITACHI LTD
15 patentsUS6621571B1Sep 16, 2003
Method and apparatus for inspecting defects in a patterned specimen
HITACHI LTD149 citations99
US6556290B2Apr 29, 2003
Defect inspection method and apparatus therefor
HITACHI LTD75 citations98
US5539514AJul 23, 1996
Foreign particle inspection apparatus and method with front and back illumination
HITACHI LTD134 citations98
US6800859B1Oct 5, 2004
Method and equipment for detecting pattern defect
HITACHI LTD55 citations96
US6084664AJul 4, 2000
Method of and apparatus for inspecting reticle for defects
HITACHI LTD76 citations96
US6064477AMay 16, 2000
Method of and apparatus for inspecting reticle for defects
HITACHI LTD74 citations96
US5410400AApr 25, 1995
Foreign particle inspection apparatus
HITACHI LTD61 citations96
US4952058AAug 28, 1990
Method and apparatus for detecting abnormal patterns
HITACHI LTD61 citations96
US5098191AMar 24, 1992
Method of inspecting reticles and apparatus therefor
HITACHI LTD57 citations94
US4922308AMay 1, 1990
Method of and apparatus for detecting foreign substance
HITACHI LTD43 citations93
US7251024B2Jul 31, 2007
Defect inspection method and apparatus therefor
HITACHI LTD10 citations84
US7791725B2Sep 7, 2010
Method and equipment for detecting pattern defect
HITACHI LTD5 citations74
US7456963B2Nov 25, 2008
Method and equipment for detecting pattern defect
HITACHI LTD7 citations74
US6921905B2Jul 26, 2005
Method and equipment for detecting pattern defect
HITACHI LTD5 citations74
US6819416B2Nov 16, 2004
Defect inspection method and apparatus therefor
HITACHI LTD12 citations74
SHINDENGEN ELECTRIC MFG
2 patentsNOZAWA OSAMU
1 patentUNIV OSAKA PUBLIC CORP
1 patentShowing the top 50 of 90 patents by PatentIndex Score.