Inventor

NOZAWA OSAMU

JP107 patents

⚠️ This page may combine multiple inventors who share the name “NOZAWA OSAMU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NOZAWA OSAMU

HOYA CORP

Magnetic recording medium having an improved magnetic characteristic

Phase shift mask and phase shift mask blank

Halftone phase shift mask and mask blank

Phase shift mask and phase shift mask blank

Magnetic recording medium and method of manufacturing the same

Magnetic recording media, methods for producing the same and magnetic recorders

Phase shift mask blank, phase shift mask, and method for manufacturing phase shift mask blank

Halftone-type phase-shift mask blank, and halftone-type phase-shift mask

Halftone phase shift mask blank, halftone phase shift mask, and method of producing the same

Manufacturing method and apparatus of phase shift mask blank

Optically semitransmissive film, photomask blank and photomask, and method for designing optically semitransmissive film

Halftone phase-shift mask blank and halftone phase-shift mask

Method for manufacturing phase shift mask blank and method for manufacturing phase shift mask

Phase shift mask blank, phase shift mask, and method for manufacturing the same

Mask blank, method for manufacturing reflective mask, and method for manufacturing semiconductor device

Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device

Mask blank, method for manufacturing phase shift mask, and method for manufacturing semiconductor device

Mask blank, phase shift mask, and method for manufacturing semiconductor device

Mask blank, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor device

Mask blank, phase-shift mask, and method of manufacturing semiconductor device

Mask blank, phase shift mask, and method for manufacturing semiconductor device

Mask blank, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor device

Mask blank, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor device

Mask blank, phase shift mask, and method for manufacturing semiconductor device

Mask blank, transfer mask, method for manufacturing transfer mask, and method for manufacturing semiconductor device

Mask blank, method of manufacturing phase shift mask, phase shift mask, and method of manufacturing semiconductor device

Reflective mask blank, reflective mask and method of manufacturing reflective mask

Mask blank, phase-shift mask, and method for manufacturing the same

Phase shift mask and phase shift mask blank

Method of manufacturing magnetic recording medium

Magnetic recording media and methods for producing the same

Method of manufacturing magnetic recording medium

Method for producing a halftone phase shift mask blank, a halftone phase shift mask blank and halftone phase shift mask

Photo mask blank and method of manufacturing the same

Mask blank, phase shift mask, and method of manufacturing semiconductor device

Phase shift mask blank, photo mask blank and manufacturing apparatus and method of blanks

Mask blank, method of manufacturing transfer mask, and method of manufacturing semiconductor device

Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device

Mask blank, phase shift mask, method for manufacturing thereof, and method for manufacturing semiconductor device

Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device

Mask blank, transfer mask and method of manufacturing transfer mask

Method of manufacturing a transfer mask and method of manufacturing a semiconductor device

Manufacturing method and apparatus of phase shift mask blank

Manufacturing method and apparatus of phase shift mask blank

Lithography mask blank and method of manufacturing the same

Mask blank, phase shift mask, and method of manufacturing semiconductor device

Reflective mask blank, reflective mask, and method for manufacturing semiconductor device

NOZAWA OSAMU

Mask blank, transfer mask, methods of manufacturing the same and method of manufacturing a semiconductor device

Photomask blank, photomask, and methods of manufacturing the same

HASHIMOTO MASAHIRO

Mask blank and transfer mask