Inventor
MUDHOLKAR MANDAR
US6 patents
Patents
6 patentsUS6358573B1Mar 19, 2002
Mixed frequency CVD process
APPLIED MATERIALS INC130 citations98
US6162709ADec 19, 2000
Use of an asymmetric waveform to control ion bombardment during substrate processing
APPLIED MATERIALS INC167 citations98
US7004107B1Feb 28, 2006
Method and apparatus for monitoring and adjusting chamber impedance
APPLIED MATERIALS INC114 citations97
US6098568AAug 8, 2000
Mixed frequency CVD apparatus
APPLIED MATERIALS INC106 citations97
US6041734AMar 28, 2000
Use of an asymmetric waveform to control ion bombardment during substrate processing
APPLIED MATERIALS INC110 citations97
US6136388AOct 24, 2000
Substrate processing chamber with tunable impedance
APPLIED MATERIALS INC63 citations95