P

Inventor

MATSUURA SHIN

JP20 patents
⚠️ This page may combine multiple inventors who share the name “MATSUURA SHIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

17 patents
US11901163B2Feb 13, 2024

Plasma processing system and edge ring replacement method

TOKYO ELECTRON LTD2 citations72
US10910251B2Feb 2, 2021

Pin control method and substrate processing apparatus

TOKYO ELECTRON LTD3 citations72
US10777435B2Sep 15, 2020

Substratre delivery method and substrate processing apparatus

TOKYO ELECTRON LTD3 citations72
US10438834B2Oct 8, 2019

Pin control method

TOKYO ELECTRON LTD3 citations72
US12394605B2Aug 19, 2025

Plasma processing system and edge ring replacement method

TOKYO ELECTRON LTD0 citations62
US10811234B2Oct 20, 2020

Plasma processing apparatus and upper electrode assembly

TOKYO ELECTRON LTD1 citations61
US12469738B2Nov 11, 2025

Substrate support, plasma processing apparatus, and ring replacement method

TOKYO ELECTRON LTD0 citations60
US12374533B2Jul 29, 2025

Plasma processing system and method of mounting annular member

TOKYO ELECTRON LTD0 citations51
US12068139B2Aug 20, 2024

Plasma processing apparatus

TOKYO ELECTRON LTD0 citations51
US11152196B2Oct 19, 2021

Substrate processing apparatus

TOKYO ELECTRON LTD0 citations51
US9941101B2Apr 10, 2018

Plasma processing apparatus and upper electrode assembly

TOKYO ELECTRON LTD1 citations51
US12165893B2Dec 10, 2024

Substrate processing system and transfer method

TOKYO ELECTRON LTD0 citations50
US12027346B2Jul 2, 2024

Substrate processing apparatus and method of driving relay member

TOKYO ELECTRON LTD0 citations50
US12165854B2Dec 10, 2024

Substrate support and substrate processing apparatus

TOKYO ELECTRON LTD0 citations46
US9773647B2Sep 26, 2017

Plasma processing apparatus and upper electrode assembly

TOKYO ELECTRON LTD1 citations45
US12531213B2Jan 20, 2026

Plasma processing apparatus

TOKYO ELECTRON LTD0 citations44
US10866017B2Dec 15, 2020

Condensation suppressing method and processing apparatus

TOKYO ELECTRON LTD0 citations39

MATSUURA SHIN

1 patent

HONDA MASANOBU

1 patent

YUSHIRO CHEM IND

1 patent