P

Inventor

SOININEN PEKKA

FI37 patents
⚠️ This page may combine multiple inventors who share the name “SOININEN PEKKA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

BENEQ OY

21 patents
US9708710B2Jul 18, 2017

Atomic layer deposition method for coating a substrate surface using successive surface reactions with multiple precursors

BENEQ OY3 citations69
US7922821B2Apr 12, 2011

Source, an arrangement for installing a source, and a method for installing and removing a source

BENEQ OY2 citations62
US11926896B2Mar 12, 2024

Atomic layer deposition apparatus

BENEQ OY0 citations60
US12180588B2Dec 31, 2024

Loading device, arrangement and method for loading a reaction chamber

BENEQ OY0 citations50
US12180587B2Dec 31, 2024

Vacuum chamber and arrangement for atomic layer deposition

BENEQ OY0 citations50
US12116668B2Oct 15, 2024

Atomic layer deposition reactor arrangement and a method for operating an atomic layer deposition reactor arrangement

BENEQ OY0 citations50
US12104248B2Oct 1, 2024

Gas feeding cup and a gas manifold assembly

BENEQ OY0 citations50
US12460292B2Nov 4, 2025

Atomic layer deposition apparatus and a method

BENEQ OY0 citations48
US11702745B2Jul 18, 2023

Nozzle and nozzle head

BENEQ OY0 citations48
US11214866B2Jan 4, 2022

Nozzle head and apparatus

BENEQ OY0 citations48
US10023957B2Jul 17, 2018

Apparatus and method for processing substrate

BENEQ OY1 citations48
US11970773B2Apr 30, 2024

Apparatus and method for atomic layer deposition (ALD)

BENEQ OY0 citations47
US12590367B2Mar 31, 2026

Precursor supply chamber

BENEQ OY0 citations46
US11549702B2Jan 10, 2023

Precursor supply cabinet

BENEQ OY0 citations46
US12442081B2Oct 14, 2025

Nozzle head and apparatus

BENEQ OY0 citations45
US12000043B2Jun 4, 2024

Precursor source arrangement and atomic layer deposition apparatus

BENEQ OY0 citations45
US11634814B2Apr 25, 2023

Atomic layer deposition apparatus

BENEQ OY0 citations45
US10590536B2Mar 17, 2020

Apparatus, method and reaction chamber

BENEQ OY0 citations45
US9683291B2Jun 20, 2017

Apparatus for processing surface of substrate and nozzle head

BENEQ OY1 citations45
US10280508B2May 7, 2019

Nozzle head and apparatus for coating substrate surface

BENEQ OY0 citations38
US10385450B2Aug 20, 2019

Method of coating a substrate and an apparatus

BENEQ OY0 citations30

NOKIA CORP

3 patents

SOININEN PEKKA

2 patents

ASM MICROCHEMISTRY LTD

1 patent

MIKROKEMIA OY

1 patent

NOKIA MOBILE PHONES LTD

1 patent

NESTE OY

1 patent

NOKIA NETWORKS OY

1 patent

RAJALA MARKKU

1 patent

NOKIA TELECOMMUNICATIONS OY

1 patent

JAUHIAINEN MIKA

1 patent

SODERLUND MIKKO

1 patent

MAKELA MILJA

1 patent

ALASAARELA TAPANI

1 patent