Inventor
SOGARD MICHAEL
US44 patents
⚠️ This page may combine multiple inventors who share the name “SOGARD MICHAEL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NIKON CORP
34 patentsUS7321415B2Jan 22, 2008
Environmental system including vacuum scavenge for an immersion lithography apparatus
NIKON CORP63 citations99
US6628503B2Sep 30, 2003
Gas cooled electrostatic pin chuck for vacuum applications
NIKON CORP151 citations99
US7456930B2Nov 25, 2008
Environmental system including vacuum scavenge for an immersion lithography apparatus
NIKON CORP51 citations96
US7355676B2Apr 8, 2008
Environmental system including vacuum scavenge for an immersion lithography apparatus
NIKON CORP51 citations96
US7250618B2Jul 31, 2007
Radiantly heated cathode for an electron gun and heating assembly
NIKON CORP18 citations92
US7030959B2Apr 18, 2006
Extreme ultraviolet reticle protection using gas flow thermophoresis
NIKON CORP22 citations92
US6897940B2May 24, 2005
System for correcting aberrations and distortions in EUV lithography
NIKON CORP39 citations92
US6734117B2May 11, 2004
Periodic clamping method and apparatus to reduce thermal stress in a wafer
NIKON CORP21 citations92
US6989922B2Jan 24, 2006
Deformable mirror actuation system
NIKON CORP23 citations90
US9423704B2Aug 23, 2016
Apparatus and methods for measuring thermally induced reticle distortion
NIKON CORP4 citations84
US7342641B2Mar 11, 2008
Autofocus methods and devices for lithography
NIKON CORP15 citations84
US7323698B2Jan 29, 2008
Thermally insulated thermophoretic plate
NIKON CORP9 citations84
US7426014B2Sep 16, 2008
Dynamic fluid control system for immersion lithography
NIKON CORP7 citations74
US7224435B2May 29, 2007
Using isotopically specified fluids as optical elements
NIKON CORP5 citations74
US6925478B2Aug 2, 2005
Practical pseudo-asynchronous filter architecture
NIKON CORP10 citations73
US9244363B2Jan 26, 2016
Environmental system including a transport region for an immersion lithography apparatus
NIKON CORP2 citations63
US9244362B2Jan 26, 2016
Environmental system including vacuum scavenge for an immersion lithography apparatus
NIKON CORP2 citations63
US7916274B2Mar 29, 2011
Measurement of EUV intensity
NIKON CORP2 citations63
US7580112B2Aug 25, 2009
Containment system for immersion fluid in an immersion lithography apparatus
NIKON CORP3 citations63
US7548303B2Jun 16, 2009
Cooling assembly for a stage
NIKON CORP3 citations63
US7162881B2Jan 16, 2007
Thermophoretic wand to protect front and back surfaces of an object
NIKON CORP6 citations63
US11313758B2Apr 26, 2022
Apparatus and methods for measuring thermally induced reticle distortion
NIKON CORP0 citations62
US10690317B2Jun 23, 2020
Illumination device for optimizing polarization in an illumination pupil
NIKON CORP0 citations52
US10612997B2Apr 7, 2020
Apparatus and methods for measuring thermally induced reticle distortion
NIKON CORP0 citations52
US9976930B2May 22, 2018
Apparatus and methods for measuring thermally induced reticle distortion
NIKON CORP0 citations52
US9977350B2May 22, 2018
Environmental system including vacuum scavenge for an immersion lithography apparatus
NIKON CORP0 citations52
US9732934B2Aug 15, 2017
Illumination device for optimizing polarization in an illumination pupil
NIKON CORP0 citations52
US9658537B2May 23, 2017
Environmental system including vacuum scavenge for an immersion lithography apparatus
NIKON CORP0 citations52
US9513460B2Dec 6, 2016
Apparatus and methods for reducing autofocus error
NIKON CORP0 citations52
US9335159B2May 10, 2016
Methods and devices for reducing errors in Goos-Hänchen corrections of displacement data
NIKON CORP0 citations52
US9097851B2Aug 4, 2015
System and method for compensating instability in an autofocus system
NIKON CORP1 citations52
US8842296B2Sep 23, 2014
Methods and devices for reducing errors in Goos-Hänchen corrections of displacement data
NIKON CORP1 citations52
US7236232B2Jun 26, 2007
Using isotopically specified fluids as optical elements
NIKON CORP1 citations52
US10466045B2Nov 5, 2019
Fluid gauges comprising multiple differential pressure sensors
NIKON CORP0 citations42
HAZELTON ANDREW J
4 patentsUS8456610B2Jun 4, 2013
Environmental system including vacuum scavenge for an immersion lithography apparatus
HAZELTON ANDREW J11 citations92
US8089610B2Jan 3, 2012
Environmental system including vacuum scavenge for an immersion lithography apparatus
HAZELTON ANDREW J13 citations92
US8836914B2Sep 16, 2014
Environmental system including vacuum scavenge for an immersion lithography apparatus
HAZELTON ANDREW J2 citations62
US8810768B2Aug 19, 2014
Environmental system including vacuum scavenge for an immersion lithography apparatus
HAZELTON ANDREW J0 citations51
SOGARD MICHAEL
4 patentsUS8994918B2Mar 31, 2015
Apparatus and methods for measuring thermally induced reticle distortion
SOGARD MICHAEL7 citations83
US8711335B2Apr 29, 2014
Stroboscopic light source for a transmitter of a large scale metrology system
SOGARD MICHAEL2 citations61
US8852858B2Oct 7, 2014
Methods and devices for hybridization and binding assays using thermophoresis
SOGARD MICHAEL1 citations51
US8194229B2Jun 5, 2012
Dynamic fluid control system for immersion lithography
SOGARD MICHAEL0 citations51