Inventor
HETZER DAVID
DE6 patents
Patents
6 patentsUS7949618B2May 24, 2011
Training a machine learning system to determine photoresist parameters
TOKYO ELECTRON LTD10 citations82
US7567353B2Jul 28, 2009
Automated process control using optical metrology and photoresist parameters
TOKYO ELECTRON LTD10 citations82
US8975009B2Mar 10, 2015
Track processing to remove organic films in directed self-assembly chemo-epitaxy applications
TOKYO ELECTRON LTD3 citations61
US7728976B2Jun 1, 2010
Determining photoresist parameters using optical metrology
TOKYO ELECTRON LTD4 citations60
US9086631B2Jul 21, 2015
EUV resist sensitivity reduction
TOKYO ELECTRON LTD1 citations49
US10354872B2Jul 16, 2019
High-precision dispense system with meniscus control
TOKYO ELECTRON LTD0 citations39