Inventor

GUPTA ANAND

US69 patents

⚠️ This page may combine multiple inventors who share the name “GUPTA ANAND”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

GUPTA ANAND

APPLIED MATERIALS INC

Increasing the sensitivity of an in-situ particle monitor

Apparatus for improving film stability of halogen-doped silicon oxide films

Method for submicron gap filling on a semiconductor substrate

Decontamination of a plasma reactor using a plasma after a chamber clean

Decontamination of a plasma reactor using a plasma after a chamber clean

Method and apparatus for improving film stability of halogen-doped silicon oxide films

Controlling plasma particulates by contouring the plasma sheath using materials of differing RF impedances

Control of particle generation within a reaction chamber

Film to tie up loose fluorine in the chamber after a clean process

Method for improving film stability of fluorosilicate glass films

Reduction of contaminant buildup in semiconductor apparatus

Plasma fluorine resistant alumina ceramic material and method of making

Method and apparatus for reducing particle contamination in a substrate processing chamber

Method and apparatus for reducing particle contamination in a substrate processing chamber

Method of producing a polycrystalline alumina ceramic which is resistant to a fluorine-comprising plasma

Method and apparatus for detecting particles on a substrate

Method for removing particulate contaminants by magnetic field spiking

Reducing particulate contamination during semiconductor device processing

Method and apparatus for reducing particle generation by limiting DC bias spike

Method for reducing particulate contamination during plasma processing of semiconductor devices

Use of electrostatic forces to reduce particle contamination in semiconductor plasma processing chambers

Film to tie up loose fluorine in the chamber after a clean process

Method and apparatus for removing particulates from semiconductor substrates in plasma processing chambers

Method and apparatus for removing particulates from semiconductor substrates in plasma processing chambers

Reducing particulate contamination during semiconductor device processing

Substrate processing system configurable for deposition or cleaning

Using ceramic wafer to protect susceptor during cleaning of a processing chamber

Particle monitor system and method

Discharging a wafer after a plasma process for dielectric deposition

Method and apparatus for improving film stability of halogen-doped silicon oxide films

Method and apparatus for improving the film quality of plasma enhanced CVD films at the interface

Method and apparatus for improving the film quality of plasma enhanced CVD films at the interface

Method and apparatus for improving the film quality of plasma enhanced CVD films at the interface

Apparatus for marking a substrate using ionized gas

PALANTIR TECHNOLOGIES INC

Display screen or portion thereof with graphical user interface

Systems and methods for coherent monitoring

Systems and methods for generating augmented reality content

Graph analysis of geo-temporal information

Systems and methods for coherent monitoring

Systems and methods for generating augmented reality content

Systems and methods for generating, analyzing, and storing data snippets

SPEEDFAM IPEC CORP

Apparatus for spin drying a workpiece

Methods for spin drying a workpiece

Post-CMP wet-HF cleaning station

REAL TIME METROLOGY INC

Optical method and apparatus for inspecting large area planar objects

SPEEDFAM CORP

Post-CMP wet-HF cleaning station

(unassigned)

Reduction of contaminant buildup in semiconductor processing apparatus

GUPTA ANAND

Methods and apparatus for forming photovoltaic cells using electrospray

CHEUNG HUGO

Haptics effect controller architecture and instruction set

DEERE & CO

Agricultural baler control system